Solar battery with functional areas prepared by means of digital-exponential hybrid doping mode and preparation method of solar battery
A solar cell and exponential doping technology, applied in the field of solar cells, can solve the problems of low separation efficiency, limited effective electric field strength, and restriction of cell performance, and achieve the effects of improving mobility, reducing hysteresis effect, and reducing recombination rate
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Embodiment 1
[0023] Such as image 3 As shown, taking the GaInP single-junction solar cell grown in the forward direction as an example, the GaAs buffer layer 2 is epitaxially grown on the GaAs (gallium arsenide) substrate 1 first, and then the AlGaInP (aluminum gallium indium phosphide) back field 3 is grown sequentially, and the GaInP Base region 4, GaInP emitter region 5, AlInP (aluminum indium phosphorus) window layer 6, GaAs cap layer 7. The structure was grown using low-pressure metal-organic chemical vapor deposition (LP-MOCVD) equipment. In the back field, base area and emitter area of the battery structure, digital-exponential doping is used for doping, in which the back field adopts such as figure 1 The negative exponential doping, that is, the doping concentration is decreasing; the base area adopts such as figure 2 The positive exponential doping, that is, the doping concentration increases; the emitter adopts such as figure 2 The positive exponential doping, that is, th...
Embodiment 2
[0025] Such as Figure 4 As shown, taking the reverse grown GaInP single-junction solar cell as an example, the GaAs buffer layer 20 is epitaxially grown on the GaAs (gallium arsenide) substrate 10 first, and then the AlInP (aluminum indium phosphide) window layer 30 is grown sequentially, and the GaInP emitter region 40 , GaInP base region 50 , AlGaInP (aluminum gallium indium phosphide) back field 60 , and GaAs contact layer 70 . The structure was grown using low-pressure metal-organic chemical vapor deposition (LP-MOCVD) equipment. The emitter region, the base region and the back field of the cell structure are doped by digital-exponential doping, wherein the emitter region is figure 1 The negative exponential doping, that is, the doping concentration is decreasing; the base area adopts such as figure 1 Negative exponential doping, that is, the doping concentration decreases; the back field adopts such as figure 2 The positive exponential doping, that is, the doping con...
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