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Method for simultaneously treating chlorsilane residual liquor and waste gas

A technology of simultaneous treatment of chlorosilane residual liquid, applied in chemical instruments and methods, silicon oxide, silicon dioxide, etc., can solve problems such as high local silicic acid concentration, environmental pollution, poor dispersion or atomization effect, etc., to achieve Reduce construction costs and operating costs, improve hydrolysis absorption efficiency, and facilitate safe operation

Active Publication Date: 2017-01-04
KUNMING UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The traditional chlorosilane raffinate treatment method has poor dispersion or atomization effect, resulting in high local chlorosilane concentration, incomplete hydrolysis in the hydrolysis tower, and continuous hydrolysis in the liquid phase slag pool. The generated hydrogen and HCl gas permeate the pool surface , Explosion accidents often occur, polluting the environment; the hydrolyzate wraps the chlorosilane residual liquid, which affects the quality of the product silica; at the same time, the local concentration of chlorosilane is too high, which will lead to a high local concentration of silicic acid in the absorption liquid, resulting in serious gelation of silicic acid , and even lead to the loss of fluidity of the absorption liquid, so that the physical properties of the produced silica cannot meet the industrial standards and cannot be reused

Method used

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  • Method for simultaneously treating chlorsilane residual liquor and waste gas
  • Method for simultaneously treating chlorsilane residual liquor and waste gas
  • Method for simultaneously treating chlorsilane residual liquor and waste gas

Examples

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Effect test

Embodiment 1

[0036] A method for simultaneously treating chlorosilane raffinate and waste gas described in this embodiment is characterized in that it comprises the following steps:

[0037](1) The chlorosilane raffinate produced by the polysilicon production unit enters the raffinate storage tank 1, and uses nitrogen as a protective gas to fill the remaining space of the raffinate storage tank, and the chlorosilane waste gas produced by the polysilicon production unit enters the waste gas buffer tank 3;

[0038] (2) Use the residual liquid delivery pump 2 to pump the chlorosilane residual liquid (the flow rate is 25L / h) to the liquid inlet pipe of the Venturi atomizer 5, and use the fan 4 to pump the chlorosilane waste gas (the flow rate is 50m 3 / h) into Venturi atomizer 5, chlorosilane residual liquid and chlorosilane waste gas are mixed and atomized in the shrinkage section and venturi atomizer throat, and the liquid-gas ratio of the atomizer is 0.5L / m 3 ;

[0039] (3) The mixed and a...

Embodiment 2

[0042] A method for simultaneously treating chlorosilane raffinate and waste gas described in this embodiment is characterized in that it comprises the following steps:

[0043] (1) The chlorosilane raffinate produced by the polysilicon production unit enters the raffinate storage tank 1, and uses nitrogen as a protective gas to fill the remaining space of the raffinate storage tank, and the chlorosilane waste gas produced by the polysilicon production unit enters the waste gas buffer tank 3;

[0044] (2) Pump chlorosilane raffinate (flow rate: 40L / h) to Venturi atomizer 5 with raffinate delivery pump 2, and blow chlorosilane waste gas (flow rate: 55m 3 / h) into Venturi atomizer 5, chlorosilane residual liquid and chlorosilane waste gas are mixed and atomized at the shrinkage section and venturi atomizer throat, and the liquid-gas ratio of the atomizer is 0.73L / m 3 ;

[0045] (3) The mixed and atomized gas is washed down from the upper part of the tower by the absorbent in th...

Embodiment 3

[0047] A method for simultaneously treating chlorosilane raffinate and waste gas described in this embodiment is characterized in that it comprises the following steps:

[0048] (1) The chlorosilane raffinate produced by the polysilicon production unit enters the raffinate storage tank 1, and uses nitrogen as a protective gas to fill the remaining space of the raffinate storage tank, and the chlorosilane waste gas produced by the polysilicon production unit enters the waste gas buffer tank 3;

[0049] (2) Pump chlorosilane raffinate (flow rate: 30L / h) to Venturi atomizer 5 liquid inlet pipe with raffinate pump 2, and blow chlorosilane waste gas (flow rate: 30m 3 / h) into Venturi atomizer 5, chlorosilane residual liquid and chlorosilane waste gas are mixed and atomized at the shrinkage section and venturi atomizer throat, and the liquid-gas ratio of the atomizer is 1L / m 3 ;

[0050] (3) The mixed and atomized gas is washed down from the upper part of the tower by the absorbent...

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Abstract

The invention discloses a method for simultaneously treating chlorsilane residual liquor and waste gas, belonging to the technical field of polycrystalline silicon production industry. Chlorsilane waste gas is pressed into a Venturi atomizer, and chlorsilane residual liquor enters a Venturi pipe; the chlorsilane waste gas and chlorsilane residual liquor are mixed and atomized through a high-speed choke tube, enter an absorption tower, and are hydrolyzed and absorbed by an absorbent (water or hydrochloric acid), thereby achieving the goal of simultaneously treating the chlorsilane waste gas and residual liquor; and the waste gas / residual liquor ratio is regulated to control the slag / water ratio of the absorbent, thereby effectively preventing the hydrolysate silicon dioxide from gelation, and ensuring the quality of the silicon dioxide. The method can be used for simultaneously treating the chlorsilane residual liquor and waste gas, and ensures the properties of the silicon dioxide produced subsequently. The treatment on the chlorsilane residual liquor and waste gas only needs one tower set, thereby lowering the construction cost and operating cost of the separate treatment devices for chlorsilane residual liquor and waste gas.

Description

technical field [0001] The invention relates to a method for simultaneously treating chlorosilane raffinate and waste gas, and belongs to the field of chlorosilane raffinate and waste gas treatment and resource utilization in the polysilicon industry. Background technique [0002] The domestic mainstream polysilicon production process is the improved Siemens method. In the process of polysilicon production by the improved Siemens method, the synthesis of trichlorosilane, rectification and purification of trichlorosilane, reduction of trichlorosilane and cold (hot) hydrogenation processes are inevitable. Chlorosilane raffinate and waste gas are produced. [0003] The main components of chlorosilane raffinate: polychlorosilane, SiCl 4 , SiHCl 3 、SiH 2 Cl 2 , HCl, a small amount of silicon powder and metal chlorides. [0004] The main component of chlorosilane waste gas: SiCl 4 , SiHCl 3 、SiH 2 Cl 2 , HCl, H 2 , N 2 . [0005] At present, most domestic polysilicon...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/12C01B7/03
CPCC01B7/035C01B33/12C01P2002/72C01P2004/03
Inventor 陈樑赵义李银光黄兵董森林章江洪
Owner KUNMING UNIV OF SCI & TECH
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