Magnetorheological chemical mechanical polishing solution used for SiC single crystal wafer and using method thereof
A chemical machinery, polishing liquid technology, applied in the direction of polishing compositions containing abrasives, etc., to achieve the effects of reducing production costs, shortening processing time, and convenient operation and use
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0035] Taking the preparation of 500ml magnetorheological mechanical polishing fluid as an example, formula A polishing fluid and formula B polishing fluid were respectively prepared and mixed evenly before polishing.
[0036] The components of formula A polishing liquid are as follows:
[0037] Diamond powder with an average particle size of 0.5μm is used for abrasive particles, and the weight percentage is 6wt%; the magnetic particles are made of hydroxyl iron powder, the purity is ≥99.7%, the average particle size is 2.5μm, and the weight percentage is 20wt%; the dispersion stabilizer is polyacrylamide , the weight percentage is 1wt%; the balance is the base carrier liquid, and the base carrier liquid is selected from high-purity deionized water.
[0038] The composition of B formula polishing liquid is as follows:
[0039] Catalyst selects Fe3O4 (triiron tetroxide), average particle size is 0.5 μm, and percentage by weight is 3wt%; Oxidant selects hydrogen peroxide aqueou...
Embodiment 2
[0059] Still taking the preparation of 500ml magnetorheological mechanical polishing fluid as an example:
[0060] The components of formula A polishing liquid are as follows:
[0061] Diamond micropowder with an average particle size of about 1.0 μm is used for abrasive grains, with a weight percentage of 3wt%; magnetic particles are made of hydroxyl iron powder, with a purity of ≥99.7%, an average particle size of 5 μm, and a weight percentage of 10 wt%; the dispersion stabilizer is polypropylene glycol, with a weight percentage of 1wt%; the base carrier liquid is made of silicone oil,
[0062] The composition of B formula polishing liquid is as follows:
[0063] Catalyst selects zero valent iron (ZVI), average particle size is 200um, percentage by weight 3wt%; Oxidant selects hydrogen peroxide aqueous solution, concentration is 30%, percentage by weight 15wt%; Base carrier liquid selects silicone oil; pH value adjuster selects concentration to be 80 % concentrated hydroch...
Embodiment 3
[0068] Take the preparation of 500ml chemical mechanical polishing fluid as an example:
[0069] The components are as follows: diamond powder with an average particle size of about 0.5 μm, 6 wt% by weight; ferric iron tetroxide, 3 wt% by weight as the catalyst, and 3 wt% by weight; hydrogen peroxide aqueous solution, 30 wt% as the oxidant %, 10wt% by weight; the dispersion stabilizer is polyacrylamide stabilizer, 1wt% by weight; the base carrier liquid is high-purity deionized water, and the pH regulator is 80% concentrated hydrochloric acid, 0.5wt% by weight %.
[0070]The preparation process of the polishing liquid is as follows: (1) ultrasonically stir the weighed abrasive grains and base carrier liquid for 3-10 minutes, and mix evenly; (2) add a dispersion stabilizer, and then ultrasonically stir for 3-10 minutes, statically to obtain a mixture of abrasive grains. (3) pickling: get another beaker to measure 200mlpH regulator and weighed catalyst through ultrasonic stirr...
PUM
Property | Measurement | Unit |
---|---|---|
particle size | aaaaa | aaaaa |
particle size | aaaaa | aaaaa |
particle size | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com