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A kind of high-strength photonic crystal film and preparation method thereof

A photonic crystal, high-strength technology, applied in optics, optical components, instruments, etc., can solve the problems of photonic crystal structure damage, limited monomers that can be photo-initiated polymerization, etc., and achieve the effect of strong practicability

Active Publication Date: 2019-02-12
DALIAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Although the above two methods can realize the preparation of high-intensity photonic crystal films, the first method requires the synthesis of specific core-shell structure microspheres, and most of them are assembled units of organic materials; the second method is more commonly used, but can The monomers for photoinitiated polymerization are limited, and the process of pouring monomers into the assembled photonic crystals will lead to partial destruction of the photonic crystal structure

Method used

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  • A kind of high-strength photonic crystal film and preparation method thereof
  • A kind of high-strength photonic crystal film and preparation method thereof
  • A kind of high-strength photonic crystal film and preparation method thereof

Examples

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Effect test

Embodiment 1

[0030] Preparation of CdS / Nitrovarnish High Intensity Photonic Crystal Films.

[0031] First prepare monodisperse CdS colloidal microspheres, the specific preparation method is as follows:

[0032] Weigh 0.6g of polyvinylpyrrolidone powder (PVP), add 30mL of diethylene glycol, and then add a certain amount of cadmium nitrate and thiourea powder, so that the concentration of cadmium nitrate and thiourea is 0.1M, and stir until all the powders are completely dissolved. The solution was heated to 150° C., kept for 1 hour, and then naturally cooled to room temperature. The product was centrifuged, washed with water three times, and dried.

[0033] A certain amount of monodisperse CdS microsphere powder was weighed, and absolute ethanol was added to prepare a dispersion with a concentration of 10 wt%.

[0034] Take a certain amount of nitro varnish and drop it on the cleaned glass slide, let it dry naturally at room temperature for 12 hours and then use it as the assembly substrat...

Embodiment 2

[0038] Preparation of CdS / PMMA high-intensity photonic crystal film.

[0039] Use the CdS dispersion in Comparative Example 1 to prepare a photonic crystal film, use PMMA as a polymer component, dissolve it in THF to prepare a solution with a mass fraction of 20%, drop it on a glass sheet and dry it naturally for 0.5h at room temperature as an assembly base use. Add the ethanol dispersion of CdS microspheres dropwise on the partially dried PMMA film so that it completely covers the surface of the polymer film, and place the whole on a heating plate at a temperature of 80°C. After the solvent is completely volatilized, high-strength Photonic crystal film.

[0040] figure 1 It is the scanning electron micrograph of the photonic crystal film obtained by direct assembly of CdS microspheres in Example 1 and the photonic crystal film wrapped in the nitro varnish film, as shown in the figure, when there is no varnish, the CdS dispersion is directly added dropwise on the glass sheet...

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Abstract

The invention discloses a high strength photonic crystal membrane and a manufacture method therefor and belongs to the field of new material manufacture. According to the photonic crystal membrane, dispersion liquid containing monodisperse nanometer microspheres is added drop by drop on a part of a dry polymer membrane surface; as a solvent volatilizes, polymers are led into gaps among the microspheres so as to form a continuous structure when the microspheres are self-assembled into photonic crystals, and therefore the high strength photonic crystal membrane can be manufactured in one step. The method is simple and safe in procedures, the photonic crystals and polymeric materials that are excellent in performance in production practice can be directly composited, and therefore a functional photonic crystal membrane can be manufactured; the method is strong in expansibility and has wide application prospects for application to equipment such as display devices, sensing devices, decoration devices and the like.

Description

technical field [0001] The invention relates to the field of photonic crystal materials, in particular to a high-intensity photonic crystal film and a preparation method thereof, belonging to the field of new material research. Background technique [0002] A photonic crystal is a structure formed by two materials with different refractive indices arranged periodically in space. This structural feature makes it capable of modulating the passage of light, that is, selectively prohibiting the passage of light of a specific wavelength through the photonic band gap. . According to the number of directions in which the refractive index changes periodically, it is divided into one-dimensional, two-dimensional and three-dimensional photonic crystals. Among them, three-dimensional photonic crystals are usually self-assembled by monodisperse microspheres, and the preparation is relatively simple, so it has attracted the attention of many researchers. Since there are only point conta...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B1/00
CPCG02B1/005
Inventor 武素丽常杰苏昕张淑芬
Owner DALIAN UNIV OF TECH