An electrostatic loudspeaker based on silicon thin film material
A silicon film, electrostatic technology, applied in the field of high-fidelity and high-sensitivity electrostatic speakers, can solve the problems of film thickness limitation, unstable speaker performance, damage, etc., to enhance stability, improve aging and damage, and solve technical difficulties. Effect
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[0030] The complete design of the electrostatic speaker of the present invention is as follows: figure 1 As shown, 1 is the diaphragm, 2 is the silicon support ring, 3 is the silicone rubber insulating pad, 4 is the stainless steel sound radiation hole plate, 5 is the shaping fixture, and 6 is the hole.
[0031] The vibrating membrane 1 of the present invention is a silicon thin film, and the ultra-thin silicon thin film and the peripheral silicon support ring 2 are made by the method of integral etching of a double-sided polished P-type (100) silicon wafer. The diameter of the silicon wafer is 4 inches, the resistance is 10-20Ω·cm, and the thickness is 300-375μm. The thinning method is to immerse the silicon wafer in a potassium hydroxide solution with a mass fraction of 50% under the condition of 90 degrees Celsius, and control the final thickness of the silicon wafer by controlling different soaking times. The rate of corrosion is approximately 80 μm / h. Using a beam of wh...
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