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Three-dimensional Dirac semimetal diffraction grating

A diffraction grating and semi-metal technology, applied in the optical field, can solve the problems of difficult generation and optimization of infrared pulse laser, high stability mode-locked pulse, poor stability, etc., and achieve easy high repetition rate ultrashort pulse and tunable working wavelength , High stability effect

Active Publication Date: 2017-05-31
NANJING UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

External cavity passive mode-locked lasers using low-dimensional nanomaterials as optical switches have many intracavity devices and complex structures, which lead to unavoidable shortcomings such as low integration, poor stability, and large energy loss of this mode-locked system.
The optical switch and the diffraction grating work separately while elongating the laser cavity length, making it difficult to obtain stable mode-locked pulses with high repetition rates
This situation makes it difficult to generate and optimize infrared pulsed lasers, which is far from meeting people's needs for infrared mode-locked pulsed lasers

Method used

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Embodiment 1

[0032] Embodiment 1: This embodiment provides a design scheme of a high-inversion three-dimensional Dirac semi-metallic diffraction grating 1 . combine figure 1 As shown, the specific scheme is as follows: reflective layer (3), including gold mirrors, silver mirrors and aluminum mirrors and high-reflectivity optical coatings, etc., is directly coated by methods such as magnetron sputtering, laser pulse deposition, electron beam evaporation, and thermal evaporation. Then use ultraviolet lithography, chemical etching, nanoimprinting and other methods to etch the strip-shaped periodic structure of the buffer layer material on the optical substrate (4), so that it has a diffraction function. On top of the reflective layer (3), magnetron sputtering, laser pulse deposition, electron beam evaporation, and thermal evaporation are used to prepare the buffer layer (2), and then the buffer layer is formed by ultraviolet lithography, chemical etching, and nanoimprinting. The material etc...

Embodiment 2

[0033] Embodiment 2: This embodiment provides a design scheme of a low-reflection three-dimensional Dirac semi-metallic diffraction grating. Specific designs, such as figure 2 As shown, the specific scheme is as follows: the Dirac semimetal in the functional layer (1) is directly coated on the optical substrate (4) by means of magnetron sputtering, laser pulse deposition, electron beam evaporation, and thermal evaporation, and then ultraviolet light is used to Engraving, chemical etching and nanoimprinting etc. will etch the Dirac semimetal strip-like periodic structure to make it have diffraction function. Finally, a passivation layer was coated on top of the Dirac semimetal using magnetron sputtering, laser pulse deposition, electron beam evaporation, and thermal evaporation.

Embodiment 3

[0034] Embodiment 3: This embodiment provides a design scheme of a high-inversion three-dimensional Dirac semi-metallic diffraction grating 2 . Specific designs, such as image 3 As shown, first, the optical substrate (4) is etched with stripe-like periodic structures by methods such as ultraviolet lithography, chemical etching and nanoimprinting, so that it has a diffraction function. Secondly, reflective layer (3), including gold mirror, silver mirror and aluminum mirror and optical coating with high reflectivity, etc., is directly coated on the optical substrate ( 4), and use methods such as ultraviolet lithography, chemical etching and nanoimprinting to etch the reflective layer material into a stripe-shaped periodic structure, so that it has a diffraction function. Then, the buffer layer (2) is prepared on the reflective layer (3) by magnetron sputtering, laser pulse deposition, electron beam evaporation and thermal evaporation, etc. The stripe-like periodic structure i...

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Abstract

The invention discloses a three-dimensional Dirac semimetal diffraction grating. Three-dimensional Dirac semimetal materials are free from gap and linear in energy dispersion relation and serve as scribed line materials. The working wavelength of the grating covers infrared areas of 2-6 micrometers, various nonlinear optical parameters can be adjusted and controlled, a device comprises a diffraction grating function layer and an optical element, the diffraction grating function layer is made of the three-dimensional Dirac semimetal materials, and the optical element is used for bearing the function layer. The three-dimensional Dirac semimetal diffraction grating is provided with a diffraction grating device based on three-dimensional Dirac semimetal, and the diffraction grating device has a high reflectance mode and a low reflectance mode. The invention further provides a particular scheme of an infrared pulse laser generating tunable wavelength by the aid of saturable absorption (or ultra-fast optical switch) characteristics of the three-dimensional Dirac semimetal diffraction grating.

Description

technical field [0001] The invention relates to a diffraction grating, in particular to a mid-infrared three-dimensional Dirac semi-metal diffraction grating based on a three-dimensional Dirac semi-metal material, and belongs to the field of optical technology. Background technique [0002] Infrared ultrashort pulse laser source is an active frontier topic in the field of nonlinear optics, and has a wide range of applications in the fields of communication, medicine, surgery and molecular spectroscopy. There are mainly two ways to generate mid-infrared pulsed laser, active and passive. Among them, the passive way is favored by people because it does not require external electronic control devices and generates shorter pulses. [0003] Optical switching devices and diffraction gratings are the core two key devices to realize passive pulsed laser generation of external cavity lasers. The optical absorptivity of the optical switching device decreases with the increase of the i...

Claims

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Application Information

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IPC IPC(8): G02B5/18H01S3/106
CPCH01S3/106G02B5/1814G02B5/1857G02B5/1861
Inventor 王枫秋秦嘉嵘朱春辉孟亚飞黎遥徐永兵张荣施毅祝世宁
Owner NANJING UNIV
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