Ceramic carrier with metal bumps and manufacturing method thereof
A manufacturing method and a technology of metal bumps, which are applied in the field of lasers, can solve problems such as photoresist blistering, degumming, and metal bump corrosion, and achieve the effect of avoiding over-corrosion problems
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Embodiment 1
[0048] Embodiment 1 of the present invention provides a method for manufacturing a ceramic carrier with metal bumps. A dielectric film 22 is grown on the surface 21 of the ceramic sheet, and the dielectric film is silicon oxide; silicon nitride; or silicon oxide and nitride Composite film of silicon. Such as Figure 8 shown, including:
[0049] In step 201 , a conductive metal layer 23 is evaporated or sputtered on the dielectric film 22 .
[0050] Wherein, the evaporation of the conductive metal layer 23 is mainly accomplished by means of electron beam evaporation, and in addition to the above-mentioned electron beam heating means, resistance heating or high-frequency induction heating may also be used.
[0051]Wherein, the sputtering of the conductive metal layer 23 is mainly completed by radio frequency (Radio Frequency, abbreviated as RF) sputtering, magnetron sputtering or ionized metal plasma (Ionized Metal Plasma, abbreviated as IMP) sputtering.
[0052] The conducti...
Embodiment 2
[0073] On the basis of the manufacturing method of the ceramic carrier with metal bumps proposed in Embodiment 1 of the present invention, based on specific processing and production examples, it is possible to give a combination of corresponding parameters and operation modes. The ceramic carrier made by the embodiment of the present invention is suitable for photodetector chip flip-chip technology, especially for compound semiconductor photodetectors, refer to Figure 8-13 , including the following steps.
[0074] In step 301, a dielectric film 22, such as silicon oxide or silicon nitride, is grown on the surface of the ceramic sheet 21 by plasma enhanced chemical vapor deposition (Plasma Enhanced Chemical Vapor Deposition, PECVD for short), with a thickness of 4000 angstroms.
[0075] In step 302, a conductive metal layer 23 is evaporated on the dielectric film 22 by electron beam evaporation, for example: chromium / gold, and its thickness is 700 angstroms / 800 angstroms, whe...
Embodiment 3
[0086] The embodiment of the present invention also provides a ceramic carrier with metal bumps, such as Figure 14 As shown, the ceramic carrier includes a ceramic sheet 21, a dielectric film 22, a conductive metal layer 23, a wire-bonding wire metal layer 24 and a metal bump 25,
[0087] The metal bump 25 is located on the lead-wire metal layer 24, the lead-wire metal layer 24 is located on the conductive metal layer 23, and the dielectric film is located on the conductive metal layer 23 and the ceramic sheet between;
[0088] Wherein, the conductive metal layer 23 is located in the first designated area 51 on the dielectric film;
[0089] Wherein, the wire-bonding wire metal layer 24 is located on the second designated area 52 on the conductive metal layer 23 .
[0090] In combination with the embodiment of the present invention, there is an optional implementation solution, the conductive metal layer 23 is specifically chromium-gold or titanium-gold.
[0091] The cerami...
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Abstract
Description
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Application Information
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