Unlock instant, AI-driven research and patent intelligence for your innovation.

A kind of high-efficiency silica sol polishing liquid not easy to crystallize and easy to clean and preparation method thereof

A technology of polishing liquid and silica sol, which is applied in the field of ultra-precision surface polishing materials, and can solve problems such as easy drying and crystallization, and difficult cleaning of workpieces

Active Publication Date: 2021-04-20
宁波日晟新材料有限公司
View PDF13 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In view of the above deficiencies in the prior art, the purpose of the present invention is to provide a high-efficiency silica sol polishing solution that is not easy to crystallize and easy to clean, so as to solve the technical problems that the traditional silica sol polishing solution is easy to dry and crystallize during use, and the workpiece is difficult to clean. Simultaneously, the polishing liquid of the present invention has strong suspension performance, long-term storage without delamination, easy to use and high polishing efficiency and other excellent performances

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of high-efficiency silica sol polishing liquid not easy to crystallize and easy to clean and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0038] Correspondingly, as the preparation method of the above-mentioned high-efficiency silica sol polishing liquid that is not easy to crystallize and is easy to clean, the preparation method comprises the following steps:

[0039] S1: Weigh 5-15 parts by weight of a water-soluble carrier, add it to 60-100 parts by weight of deionized water, then add 20-50 parts by weight of a silicon oxide polishing agent, and stir and mix evenly;

[0040] S2: Add 3-8 parts by weight of a complexing agent, stir evenly, and finally add 1-5 parts by weight of an oxidant, adjust the pH value to 8-9, and stir well to obtain the high-efficiency silica sol that is not easy to crystallize and easy to clean Polishing fluid.

[0041] The sulfonated melamine formaldehyde resin of the present invention has excellent wetting and dispersing properties, reduces the amount of deionized water added in the polishing solution, thereby ensuring that the silica sol crystallizes and absorbs the polishing soluti...

Embodiment 1

[0046] The high-efficiency silica sol polishing solution that is not easy to crystallize and easy to clean in this embodiment is composed of the following raw materials in parts by weight: 30 parts by weight of a silicon oxide polishing agent, 10 parts by weight of a water-soluble carrier that reduces the volatility of the polishing solution , 5 parts by weight of a complexing agent for cleaning, 3 parts by weight of an oxidizing agent and 60 parts by weight of deionized water.

[0047] The silicon oxide polishing agent is added to the polishing solution in the form of nanocomposite particles with a core-shell structure. The core-shell nanocomposite particles are silicon dioxide in the core and sulfonated melamine formaldehyde resin in the shell.

[0048] The water-soluble carrier is a composition of glycerol and polymer polyol with a mass ratio of 3:1.

[0049] The nitrogen-containing organic small molecule complexing agent is nitroxide free radical piperidinol.

[0050] The...

Embodiment 2

[0052] The high-efficiency silica sol polishing solution that is not easy to crystallize and easy to clean in this embodiment is composed of the following raw materials in parts by weight: 20 parts by weight of a silicon oxide polishing agent, and 5 parts by weight of a water-soluble carrier that reduces the volatility of the polishing solution 3 parts by weight of complexing agent for cleaning, 1 part by weight of oxidant and 50 parts by weight of deionized water.

[0053] The silicon oxide polishing agent is added to the polishing solution in the form of nanocomposite particles with a core-shell structure. The core-shell nanocomposite particles are silicon dioxide in the core and sulfonated melamine formaldehyde resin in the shell.

[0054] The water-soluble carrier is a composition of diethylene glycol and polymer polyol with a mass ratio of 2.5:1.

[0055] The nitrogen-containing organic small molecule complexing agent is a composition of hydroxymethoxy 4-methylphenyl-nitr...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a high-efficiency silica sol polishing liquid that is not easy to crystallize and is easy to clean. The silica sol polishing liquid is composed of the following raw materials in parts by weight: 20-40 parts by weight of silicon oxide polishing agent, water-soluble polishing agent that reduces the volatility of polishing liquid 5-15 parts by weight of carrier, 3-8 parts by weight of complexing agent for cleaning aid, 1-5 parts by weight of oxidizing agent and 50-80 parts by weight of deionized water. The polishing liquid of the present invention solves the technical problem that the traditional silica sol polishing liquid is easy to dry and crystallize during use, and the workpiece is difficult to clean; at the same time, the polishing liquid of the present invention has strong suspension performance, and is not delaminated for long-term storage, which is convenient for use and polishing High efficiency and excellent performance. The invention also discloses a preparation method of high-efficiency silica sol polishing liquid which is not easy to crystallize and easy to clean.

Description

technical field [0001] The invention relates to the technical field of polishing materials for ultra-precision surfaces, in particular to a high-efficiency silica sol polishing solution that is not easy to crystallize and easy to clean and a preparation method thereof. Background technique [0002] The development goal of modern manufacturing industry is the intelligent manufacturing of Industry 4.0. The crown of intelligent manufacturing is ultra-precision manufacturing, and the pearl of the crown of ultra-precision surface is the processing of ultra-precision and non-damaged surface. For example, the manufacture of ultra-large integrated circuit chips has entered the 7-nanometer node. In this ultra-precision manufacturing process, the characteristics of the device are at the nanometer level, which is close to the human neuron system. The fabrication of state-of-the-art VLSI chips cannot be accomplished without the assurance of ultra-precise surface processing. At present,...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C09G1/02
CPCC09G1/02
Inventor 孙韬
Owner 宁波日晟新材料有限公司