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Method and device for complete inactivation of tantalum powder

A tantalum powder and gas technology, applied in the field of tantalum metal processing, can solve the problems of high oxygen content in tantalum powder, hot and hot, and sometimes sparks are generated from one place and spread immediately, so as to reduce the loss of tantalum powder, Beneficial to the health of operators and the effect of reducing environmental pollution

Active Publication Date: 2017-07-18
江门富祥电子材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the long-term scientific research and production practice, the present inventor poured out the heat-treated and passivated tantalum powder from the crucible, and when the agglomerated tantalum powder was smashed, he found that the tantalum powder soon became hot and hot, sometimes from Sparks are generated in one place and spread immediately, and there is nothing to do. Even if various measures are taken to reduce the occurrence of fire accidents of tantalum powder, there is still the problem that tantalum powder is oxidized under uncontrollable conditions, resulting in high oxygen content in tantalum powder.

Method used

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  • Method and device for complete inactivation of tantalum powder
  • Method and device for complete inactivation of tantalum powder

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0067] Coagulation heat treatment of tantalum powder

[0068] The tantalum powder prepared by reducing potassium fluorotantalate with sodium has a specific surface area of ​​0.61 cm after washing with water, pickling and drying. 2 / g, oxygen content is that the tantalum powder 121 of 3060ppm is packed into tantalum crucible 122 after granulation grouping, the above-mentioned crucible that tantalum powder is housed is packed in the vacuum heat treatment furnace again and carries out condensation heat treatment according to prior art, rises to 1380 ℃, keep warm for 30 minutes, then power off and cool down to 28°C, pass in a mixed gas composed of argon and air to passivate the tantalum powder, the temperature of the tantalum powder after passivation is 27°C, put the tantalum powder together with The crucible 122 of powder 121 is removed from the heat treatment furnace. These heat-treated tantalum powders are divided into two parts and processed according to the following two met...

Embodiment 2

[0075] Tantalum powder deoxidation heat treatment:

[0076] With heat-treated tantalum powder, the specific surface area is 0.41m 2 / g, the oxygen content is 4050ppm, in the tantalum powder, mix the magnesium powder of 1.5% of tantalum powder weight, the above-mentioned mixed powder is housed in the tantalum crucible and then packs in the deoxidation heat treatment furnace, carries out deoxidation heat treatment according to the patent number CN102965525B method, at 930 ℃ for 3 hours, and exhausted to remove magnesium, lower the temperature to 15 ℃ for passivation, after passivation, the tantalum powder is released from the furnace at 27 ℃. The tantalum powder after these deoxidation heat treatments are divided into two parts and processed according to the following two methods:

[0077] Tantalum powder is fully passivated:

[0078] A part of the tantalum powder prepared by the above-mentioned deoxidation heat treatment is processed according to the method of the present inv...

Embodiment 3

[0083] Coagulation heat treatment of tantalum powder:

[0084] The tantalum powder prepared by reducing potassium fluorotantalate with sodium has a specific surface area of ​​1.01m after washing with water, pickling and drying 2 / g, the tantalum powder with an oxygen content of 7560ppm is put into tantalum crucible 10 li after granulation and agglomeration. Minutes, then cut off the power and cool down to 20°C, pass in a mixed gas composed of argon and air to passivate the tantalum powder, the temperature of the tantalum powder after passivation treatment is 25°C, put the tantalum powder together with the crucible containing the tantalum powder from Take it out of the heat treatment furnace. The tantalum powder after these condensation heat treatments is divided into two parts and processed according to the following two methods:

[0085] Tantalum powder is fully passivated:

[0086] A part of the tantalum powder prepared by the above-mentioned heat treatment is processed a...

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Abstract

The invention relates to a method for complete inactivation of tantalum powder obtained after heat treatment. The method is characterized in that tantalum powder caking, subject to heat treatment and inactivation, in a vacuum heat treatment furnace and a crucible containing the tantalum powder are placed in a sealed container, under the controllable oxygen concentration, the tantalum powder caking is peeled out of the crucible, the caking is smashed and sieved, and the tantalum powder is subject to complete inactivation. The invention further provides a device for complete inactivation of tantalum powder. The tantalum powder prepared through the method is low in oxygen content, and the fire accident caused when the tantalum powder is peeled out of the crucible and is smashed and sieved is avoided.

Description

technical field [0001] The invention relates to the field of tantalum metal treatment, more specifically, the invention relates to a method and a device for completely passivating tantalum powder after heat treatment. Background technique [0002] Rare and precious metal tantalum has high melting point, low vapor pressure, good cold working performance, high chemical stability, strong resistance to liquid metal and acid and alkali corrosion, and high dielectric constant value of surface oxide film. Metal tantalum and its alloys are important functional materials. It is widely used in the fields of electronics, integrated circuits, steel, metallurgy, chemical industry, cemented carbide, atomic energy, aerospace and strategic weapons and other industries; due to the good biocompatibility and high biological activity of tantalum, tantalum and its alloys It is also widely used in the field of medical device technology. High purity is required in tantalum applications, especiall...

Claims

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Application Information

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IPC IPC(8): B22F1/00
CPCB22F1/145
Inventor 郑浩宇朱德忠廖志刚
Owner 江门富祥电子材料有限公司