Original ferment straining and repairing mask

A mask and enzyme technology, applied in skin care preparations, cosmetics, cosmetic preparations, etc., can solve problems such as inability to repair and supplement skin, affect skin respiration and circulation, and inability to remove nutrients in time, and achieve good skin care and moisturizing. and repair effect, increase skin elasticity and tension, solve the effect of skin laxity

Inactive Publication Date: 2017-10-03
江苏蓓俪芙生物科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In recent years, there have been many masks on the market that claim to be able to care and repair facial skin. However, most of them are developed based on the principle of supplementation. They have a single effect, purely moisturizing or purely repairing, and the skin passively receives nutrients.
But in fact, pure hydration is obviously unable to provide sufficient repair and nutritional supplement to the skin, and the nutrients that have not been absorbed by the skin in the simple repair mask cannot be eliminated in time, which affects the normal breathing and circulation of the skin, and instead increases the burden on the skin

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] Example 1: A native enzyme firming and repairing facial mask, its components include: tremella fruiting body extract 3%, yeast fermentation product 3%, centella asiatica extract 2%, ginseng root extract in terms of mass percentage 3%, Scutellaria baicalensis extract 1.5%, Sodium hyaluronate 0.05%, Rose flower extract 3%, Betaine 0.5%, Bio-glucose gum-1 1.5%, Licorice root extract 0.5%, Peony root extract 0.3% , butanediol 5%, glycerin 2%, glyceryl polyether-26 1%, polyglycerol-10 1%, caprylyl glycol 0.1%, bis(hydroxymethyl) imidazolidinyl urea 0.1%, sodium polyacrylate 0.1%, p-anisic acid 0.05%, methylparaben 0.1%, water 72.2%.

[0029] The preparation method of embodiment 1 is: firstly sodium polyacrylate, methylparaben, sodium hyaluronate are heated to 80-85 degrees centigrade, homogenized for 3 minutes, after cooling to 45 degrees centigrade, add the remaining components of the raw materials, and After each component is added, the next component should be added afte...

example 2 to example 5

[0031] Repeat for tremella fruiting body extract, yeast fermentation product, centella asiatica extract, ginseng root extract, scutellaria baicalensis extract, rose flower extract, licorice extract, and other skin conditioning agents as specified in Table 1 below According to the method of Experimental Example 1, the plant enzyme oil-controlling and acne-removing mask products of different components were obtained respectively. Since water and basic moisturizing agents, preservatives, thickeners, and other auxiliary materials have almost no effect on product efficacy, therefore, in this formula Not to give examples one by one:

[0032] Table 1:

[0033] Skin Conditioner Components

[0034] The preparation method of the products in Examples 2 to 5 is consistent with the preparation method of Product 1 in Example 1.

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PUM

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Abstract

The invention provides an original ferment straining and repairing mask. The mask comprises the following raw materials: butylene glycol, glycerin, tremella sporophore extract, a yeast fermentation product, centella extract, ginseng extract, large-flowered skullcap root extract, sodium hyaluronate, rose flower extract, betaine, bio-saccharide gum-1, licorice root extract and peony root extract. The original ferment straining and repairing mask supplies facial skin with nutrients, dredges aquaporin and nutrient absorption channels in time and has doubled skin-care effect. The invention also provides a preparation method for the original ferment straining and repairing mask.

Description

technical field [0001] The invention relates to the field of daily cosmetics, in particular to a native enzyme firming and repairing facial mask. Background technique [0002] With the development of the current economy, the rhythm of work and life is getting faster and faster, and people's mental pressure is also increasing. Coupled with bad living habits and the lack of necessary protection for the facial skin, it is very easy to cause facial damage. The skin is affected by the external environment, such as ultraviolet rays, smog particles, dry air, cold air, etc. More and more people are suffering from dry, rough skin, enlarged pores, dull complexion, acne and other skin conditions. Troubled by disorders, it can even lead to sagging skin and fine lines. Therefore, more and more people begin to pay attention to the care of facial skin, and people's demand for facial mask is also more and more vigorous, and the prospect of repairing facial mask is broad. [0003] In recen...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/9789A61K8/9728A61K8/73A61K8/44A61K8/34A61Q19/00
Inventor 陶萍
Owner 江苏蓓俪芙生物科技有限公司
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