Original ferment straining and repairing mask

Abstract

The invention provides an original ferment straining and repairing mask. The mask comprises the following raw materials: butylene glycol, glycerin, tremella sporophore extract, a yeast fermentation product, centella extract, ginseng extract, large-flowered skullcap root extract, sodium hyaluronate, rose flower extract, betaine, bio-saccharide gum-1, licorice root extract and peony root extract. The original ferment straining and repairing mask supplies facial skin with nutrients, dredges aquaporin and nutrient absorption channels in time and has doubled skin-care effect. The invention also provides a preparation method for the original ferment straining and repairing mask.

Description

technical field

[0001] The invention relates to the field of daily cosmetics, in particular to a native enzyme firming and repairing facial mask. Background technique

[0002] With the development of the current economy, the rhythm of work and life is getting faster and faster, and people's mental pressure is also increasing. Coupled with bad living habits and the lack of necessary protection for the facial skin, it is very easy to cause facial damage. The skin is affected by the external environment, such as ultraviolet rays, smog particles, dry air, cold air, etc. More and more people are suffering from dry, rough skin, enlarged pores, dull complexion, acne and other skin conditions. Troubled by disorders, it can even lead to sagging skin and fine lines. Therefore, more and more people begin to pay attention to the care of facial skin, and people's demand for facial mask is also more and more vigorous, and the prospect of repairing facial mask is broad.

[0003] In recen...