Preparation method for conductive, anti-corrosive, wear-resistant and high-hardness diamond-like coating layer
A wear-resistant, high-hardness technology, applied in metal material coating process, coating, ion implantation plating, etc., can solve the problem of high resistance of carbon-based thin film, reduce the number of droplets, improve the quality and performance, The effect of easy temperature control
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[0022] Implementation example 1;
[0023] The first step: the substrate is ultrasonically cleaned in a special solution for 20 minutes, and finally heated and dried with deionized water, alcohol, and a hair dryer;
[0024] Step 2: The substrate is loaded on the vacuum equipment turret, and the speed is adjusted to 2.5r / min;
[0025] The third step: close the door of the vacuum equipment and vacuum; when the pressure in the vacuum chamber reaches 5x10-2Pa, turn on the heater to heat;
[0026] The fourth step: When the vacuum chamber pressure reaches 1X10-3Pa, the temperature is 50-100 degrees, argon gas is introduced, the ion source ionizes the inert gas, and the surface of the substrate is cleaned and activated. The ion source current is 10-20A;
[0027] Step 5: Turn off the ion source, turn on the bias voltage of 300V, the duty cycle is 20%, turn on the magnetron target, the magnetron target current is 2-80A, and the titanium transition layer thickness is 200-300nm;
[0028] The sixth s...
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[0032] Implementation example 2
[0033] The first step: the substrate is ultrasonically cleaned in a special solution for 20 minutes, and finally heated and dried with deionized water, alcohol, and a hair dryer;
[0034] Step 2: The substrate is loaded on the vacuum equipment turret, and the speed is adjusted to 2.5r / min;
[0035] The third step: Close the vacuum equipment door, vacuum, wait until the vacuum chamber pressure is 5x10-2Pa, turn on the heater to heat;
[0036] The fourth step: When the pressure in the vacuum chamber reaches 1X10-3Pa, the temperature is 50-100 degrees, argon gas is introduced, the ion source ionizes the inert gas, and the surface of the substrate is cleaned and activated. The current is 10-20A;
[0037] Step 5: Turn off the ion source, turn on the bias voltage of 300V, the duty cycle is 20%, turn on the magnetron target, the magnetron target current is 10A, and the thickness of the titanium transition layer is 200-300nm;
[0038] Step 6: Turn on the ion sou...
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