Preparation method for conductive, anti-corrosive, wear-resistant and high-hardness diamond-like coating layer

A wear-resistant, high-hardness technology, applied in metal material coating process, coating, ion implantation plating, etc., can solve the problem of high resistance of carbon-based thin film, reduce the number of droplets, improve the quality and performance, The effect of easy temperature control

Inactive Publication Date: 2017-11-10
大连金泰正新科技有限公司
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AI-Extracted Technical Summary

Problems solved by technology

However, the film itself has performance defects. This carbon-based film has h...
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Abstract

The invention discloses a preparation method for a conductive, anti-corrosive, wear-resistant and high-hardness carbon-based film. The preparation method comprises the following steps: heating by virtue of a heating pipe in a vacuum chamber; ionizing argon gas by virtue of an ion source; cleaning and activating a base material clamped on a rotating stand in the vacuum chamber; carrying out magnetic target deposition on titanium metal after a vacuum pressure is achieved; then carrying out acetylene ionization by virtue of the ion source; and finally cooling in an inert gas. The conductivity, anti-corrosive property, wear resistance, high hardness and other performance of the film prepared by the preparation method disclosed by the invention meet the application needs of many industries such as semiconductors, mobile phones, chemical electrolysis and electric spark machining.

Application Domain

Technology Topic

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  • Preparation method for conductive, anti-corrosive, wear-resistant and high-hardness diamond-like coating layer
  • Preparation method for conductive, anti-corrosive, wear-resistant and high-hardness diamond-like coating layer
  • Preparation method for conductive, anti-corrosive, wear-resistant and high-hardness diamond-like coating layer

Examples

  • Experimental program(2)

Example Embodiment

[0022] Implementation example 1;
[0023] The first step: the substrate is ultrasonically cleaned in a special solution for 20 minutes, and finally heated and dried with deionized water, alcohol, and a hair dryer;
[0024] Step 2: The substrate is loaded on the vacuum equipment turret, and the speed is adjusted to 2.5r/min;
[0025] The third step: close the door of the vacuum equipment and vacuum; when the pressure in the vacuum chamber reaches 5x10-2Pa, turn on the heater to heat;
[0026] The fourth step: When the vacuum chamber pressure reaches 1X10-3Pa, the temperature is 50-100 degrees, argon gas is introduced, the ion source ionizes the inert gas, and the surface of the substrate is cleaned and activated. The ion source current is 10-20A;
[0027] Step 5: Turn off the ion source, turn on the bias voltage of 300V, the duty cycle is 20%, turn on the magnetron target, the magnetron target current is 2-80A, and the titanium transition layer thickness is 200-300nm;
[0028] The sixth step: Turn on the ion source, the ion source current is 30-40A, and acetylene gas is introduced. After the hydrocarbon gas is ionized, it is coated on the surface of the substrate. The thickness of the diamond-like carbon doped titanium film is 1-2μm;
[0029] Step 7: Turn off the bias voltage, ion source, magnetron target, and pass in inert gas until the temperature drops to 40 degrees, then open the door to take the substrate;
[0030] Step 8: Repeat the first step, the second step, the third step, the fourth step, the sixth step, the seventh step, and the fifth step and set the duty cycle to 50% and 80% respectively;
[0031] by figure 1 , figure 2 It can be seen that the conductivity and corrosion resistance of films prepared with different duty ratios are different, and the best effect is when the duty ratio is 20%.

Example Embodiment

[0032] Implementation example 2
[0033] The first step: the substrate is ultrasonically cleaned in a special solution for 20 minutes, and finally heated and dried with deionized water, alcohol, and a hair dryer;
[0034] Step 2: The substrate is loaded on the vacuum equipment turret, and the speed is adjusted to 2.5r/min;
[0035] The third step: Close the vacuum equipment door, vacuum, wait until the vacuum chamber pressure is 5x10-2Pa, turn on the heater to heat;
[0036] The fourth step: When the pressure in the vacuum chamber reaches 1X10-3Pa, the temperature is 50-100 degrees, argon gas is introduced, the ion source ionizes the inert gas, and the surface of the substrate is cleaned and activated. The current is 10-20A;
[0037] Step 5: Turn off the ion source, turn on the bias voltage of 300V, the duty cycle is 20%, turn on the magnetron target, the magnetron target current is 10A, and the thickness of the titanium transition layer is 200-300nm;
[0038] Step 6: Turn on the ion source, the ion source current is 30-40A, and acetylene gas is introduced. After the hydrocarbon gas is ionized, the surface of the substrate is deposited. The thickness of the diamond-like doped titanium film is 1-2μm;
[0039] Step 7: Turn off the bias voltage, ion source, magnetron target, and pass in inert gas until the temperature drops to 40 degrees, then open the door to take the substrate;
[0040] The eighth step: repeat the first step, the second step, the third step, the fourth step, the sixth step, the seventh step, and the fifth step. The magnetron target current is set to 40A and 70A respectively.
[0041] by image 3 , Figure 4 It can be seen that the conductivity and corrosion resistance of films prepared with different magnetron target currents are different, and the best effect is when the magnetron target current is 10A.
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PUM

PropertyMeasurementUnit
Thickness1.0 ~ 2.0µm
tensileMPa
Particle sizePa
strength10

Description & Claims & Application Information

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