Photosensitive liquid resin

A technology of liquid resin and epoxy resin, which is applied in the fields of optics, optomechanical equipment, instruments, etc., can solve the problems of high price, achieve high manufacturing precision, improve curing forming precision, and good photosensitivity

Inactive Publication Date: 2017-11-17
GUANGXI ZHONGCHANG RESIN
View PDF7 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, there are few photosensitive resin products for high-precision, high-heat-resistant stereolithography rapid prototyping materials in China, and they are expensive

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0015] Embodiment 1: This photosensitive liquid resin comprises the raw material of following parts by weight: 85 parts of novolac epoxy resins, 10 parts of double-ended acrylate-based polysiloxanes, 5 parts of polyacrylate-based polysiloxanes, acrylate polysiloxanes 10 parts of siloxane, 1 part of 1-hydroxycyclohexyl acetophenone.

[0016] After being formed by UV curing, its volume shrinkage rate=0.9%, warpage factor CF(6)=0.01, CF(11)=0.03.

Embodiment 2

[0017] Embodiment 2: This photosensitive liquid resin comprises the raw material of following weight portion: 85 parts of bisphenol A type epoxy resins, 85 parts of two-end acrylate-based polysiloxanes, 50 parts of polyepoxy polysiloxanes, polyepoxy polysiloxanes 20 parts of acrylate-based polysiloxane, 60 parts of acrylate, 6 parts of benzoin dimethyl ether;

[0018] After being formed by UV curing, the volume shrinkage rate is <0.8%, the warpage factor CF(6) <0.01, and the CF(11) <0.03.

Embodiment 3

[0019] Embodiment 3: This photosensitive liquid resin comprises the raw material of following weight portion: 85 parts of cycloaliphatic epoxy resins, 85 parts of double-end acrylate-based polysiloxanes, 50 parts of polyepoxy polysiloxanes, oxa Cyclobutane compound 50 parts, polyacrylate polysiloxane 20 parts, triethylene glycol divinyl ether 30 parts, 4-hydroxybutyl vinyl ether 30 parts, benzophenone 3 parts, 4-p-toluene 3 parts of mercaptobenzophenone.

[0020] After being formed by UV curing, the volume shrinkage rate is <0.8%, the warpage factor CF(6)<0.01, and the CF(11)<0.03.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses photosensitive liquid resin, which relates to the technical field of chemical industry. The photosensitive liquid resin is prepared from the following raw materials in parts by weight: 10 to 85 parts of epoxy resin, 10 to 85 parts of dimethacrylate polysiloxane, 0 to 50 parts of poly-epoxy polysiloxane, 0 to 50 parts of oxetane compound, 5 to 20 parts of polyacrylate polysiloxane, 10 to 60 parts of diluting agent, and 1 to 6 parts of radical initiator. The photosensitive liquid resin solves the problem that the high-precision and high-heat-resistance photosensitive liquid resin is high in price.

Description

technical field [0001] The invention relates to the technical field of chemistry and chemical engineering, in particular to a photosensitive liquid resin. Background technique [0002] Photosensitive resin, also known as photosensitive resin (UV resin), is composed of polymer monomers and prepolymers. The materials mainly include oligomers, reactive diluents and photoinitiators. Under the irradiation of ultraviolet light of a certain wavelength (250-300 nanometers), the polymerization reaction is caused immediately, and the curing is completed. Photosensitive resins are generally liquid, and are generally used to make materials with high strength, high temperature resistance, and waterproof. The oligomer is the main body of the photosensitive resin. It is a base material containing unsaturated functional groups. Its terminal has active groups that can be polymerized. Once there are active species, it can continue to polymerize and grow. Once polymerized, the molecular weigh...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/075
CPCG03F7/0757
Inventor 黄桂彬蒋茵荣
Owner GUANGXI ZHONGCHANG RESIN
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap