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A wear-resistant self-cleaning photovoltaic glass anti-reflection hydrophobic coating solution and preparation method thereof

A photovoltaic glass and self-cleaning technology, applied in anti-fouling/underwater coatings, coatings, paints containing biocide, etc., can solve the problems of poor service life, poor hydrophobic angle, high energy consumption, etc., and prevent light transmission Efficiency reduction, easy to keep clean, and simple reaction process

Active Publication Date: 2020-07-21
南通天驰环保科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] At present, the main methods for the technology of hydrophobic photovoltaic anti-reflection coatings are: high-temperature sintering method, the preparation process of photovoltaic glass anti-reflection and anti-reflection coatings prepared by this method adopts high-temperature sintering method, which requires extremely high energy consumption; sol-gel For the alkali-catalyzed film layer, the surface is looser than the acid-catalyzed film layer, which improves the light transmittance, but its fatality is poor, and its lifespan is not as good as that of the acid-catalyzed film layer.
However, the acid-catalyzed film cured at room temperature, although the density is improved and the life is improved, but the light transmittance is not as good as that of the alkali-catalyzed film, and the hydrophobic angle is far inferior to that of the alkali-catalyzed film, which also reduces its self-cleaning property.

Method used

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  • A wear-resistant self-cleaning photovoltaic glass anti-reflection hydrophobic coating solution and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] A: Acid-catalyzed gel: dissolve 3 grams of heptadecanylfluorodecyltrimethoxysilane and 1.5 grams of tetraethyl orthosilicate in 80 grams of ethanol, add 36% hydrochloric acid, adjust the pH to 3, and heat at 50 degrees Celsius for 3 hours to stop Stir, heat to 40°C, vacuum the hydrochloric acid

[0028] B: Alkali-catalyzed gel: 3 grams of heptadecafluorodecyltrimethoxysilane and 1.5 g of tetraethyl orthosilicate were dissolved in 80 grams of ethanol, slowly added 25% ammonia water at 25 degrees Celsius, adjusted to pH 10, and stirred for 5 hours , heated to 40 degrees Celsius, vacuumed to remove ammonia, sealed and aged at room temperature for 7 days

[0029] C: Slowly add 1 volume of base-catalyzed gel to 1 volume of acid-catalyzed gel, stir while adding, and continue stirring for 3 minutes after the addition is complete.

[0030] D: Spray the mixed system on the ultra-white glass, level it naturally, and cure it at room temperature for 24 hours to test

Embodiment 2

[0032] A: Acid-catalyzed gel: Dissolve 3 g of tridecafluorooctyltrimethoxysilane and 1.5 g of tetraethyl orthosilicate in 80 g of ethanol, add 36% hydrochloric acid, adjust the pH to 3, and heat at 50 degrees Celsius for 3 hours to stop Stir, heat to 40°C, vacuum out acetic acid

[0033] B: Alkali-catalyzed gel: 3 grams of heptadecafluorodecyltrimethoxysilane and 1.5 g of tetraethyl orthosilicate were dissolved in 80 grams of ethanol, slowly added 25% ammonia water at 25 degrees Celsius, adjusted to pH 10, and stirred for 5 hours , heated to 40 degrees Celsius, vacuumed to remove ammonia, sealed and aged at room temperature for 7 days

[0034] C: Slowly add 1 volume of base-catalyzed gel to 1 volume of acid-catalyzed gel, stir while adding, and continue stirring for 3 minutes after the addition is complete.

[0035] D: Spray the mixed system on the ultra-clear glass, and cure it at room temperature for 24 hours to test

Embodiment 3

[0037] A: Acid-catalyzed gel: Dissolve 3 grams of heptadecanylfluorodecyltrimethoxysilane and 1.5 grams of tetraethyl orthosilicate in 80 grams of ethanol, add 36% nitric acid, adjust the pH to 3, and heat at 50 degrees Celsius for 3 hours to stop Stir, heat to 40°C, vacuum out acetic acid

[0038] B: Alkali-catalyzed gel: 3 g of tridecafluorooctyltrimethoxysilane and 1.5 g of tetraethyl orthosilicate were dissolved in 80 g of ethanol, slowly added 25% ammonia water at 25 degrees Celsius, adjusted the pH to 10, and stirred for 5 hours , heated to 40 degrees Celsius, vacuumed to remove ammonia, sealed and aged at room temperature for 7 days

[0039] C: Slowly add 1 volume of base-catalyzed gel to 1 volume of acid-catalyzed gel, stir while adding, and continue stirring for 3 minutes after the addition is complete.

[0040] D: Spray the mixed system on the ultra-clear glass, and cure it at room temperature for 24 hours to test

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Abstract

The invention relates to a surface hydrophobic agent, in particular an anti-reflection hydrophobic coating liquid for wear resistant self-cleaning photovoltaic glass. The provided preparation method of the anti-reflection hydrophobic coating liquid comprises the following steps: step one, dissolving perfluoroalkyl silane and tetraethyl orthosilicate into an organic solvent, adding an acid catalyst to carry out hydrolysis, and removing the acid catalyst to obtain an acid catalyzed reaction system; step two, dissolving perfluoroalkyl silane and tetraethyl orthosilicate into an organic solvent, adding an alkali catalyst to carry out hydrolysis, removing the alkali catalyst, and carrying out aging to obtain an alkali catalyzed reaction system, wherein the adopted organic solvent is the same as the organic solvent used in the step one; and step three, mixing the acid catalyzed reaction system obtained in the step one and the alkali catalyzed reaction system obtained in the step two, and evenly stirring to obtain the anti-reflection hydrophobic coating liquid. The provided anti-reflection hydrophobic coating liquid has a good hydrophobic property, satisfied light transmittance and good wear resistance.

Description

technical field [0001] The invention relates to a surface hydrophobic agent, in particular to an anti-reflection hydrophobic coating solution for wear-resistant self-cleaning photovoltaic glass. Background technique [0002] The well-known photoelectric conversion of solar energy relies on silicon wafers in solar cell components, which have a good light absorption effect. With the continuous improvement of solar cell components, the photoelectric conversion rate of silicon wafers in solar cell components is at the current level. The level of manufacturing technology has reached the limit, and it has become a difficult problem to improve the photoelectric conversion rate of solar cells. At the same time, since the workplaces of solar cells are mostly installed outdoors or in deserts with harsh environments, the surface of solar cell modules is easy to get dirty, and it is difficult to clean after being dirty. Photovoltaic glass anti-reflection coating is a coating material c...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C09D183/08C09D5/16
CPCC09D1/00C09D5/1687
Inventor 吴刚陆峰
Owner 南通天驰环保科技有限公司
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