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Preparation method of large-dimension high-quality graphene based on self limitation nucleation growth

A graphene, large-scale technology, applied in graphene, chemical instruments and methods, vacuum evaporation coating, etc., can solve problems such as affecting film quality and increasing nucleation points, achieve rapid film formation and reduce nucleation rate Effect

Active Publication Date: 2017-12-29
XI AN JIAOTONG UNIV +1
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  • Application Information

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Problems solved by technology

[0003] Nickel has high carbon solubility at high temperature. When graphene is grown on a nickel substrate, there are fewer nucleation points of graphene during the high temperature process, and the carbon atoms produced by catalysis are solid-dissolved in nickel metal. A large amount of carbon atoms will be precipitated, which not only increases the number of nucleation points, but also easily forms multi-layer graphene, which affects the quality of the film

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  • Preparation method of large-dimension high-quality graphene based on self limitation nucleation growth
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  • Preparation method of large-dimension high-quality graphene based on self limitation nucleation growth

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Embodiment Construction

[0022] The implementation of the present invention will be described in detail below in conjunction with the examples.

[0023] A method for preparing large-scale high-quality graphene based on self-limited nucleation growth, comprising the following steps:

[0024] (1) Using polycrystalline or single crystal copper foil substrate copper foil 1, after chemical polishing treatment on the surface, nickel metal deposition covering, such as figure 1 As shown, the nickel covering layer 2 is polycrystalline or single crystal metallic nickel by electroplating or physical coating, and the thickness is greater than 1 μm.

[0025] (2) if figure 2 As shown, the copper foil 5 covered with nickel metal is put into the growth chamber to evacuate, and an inert gas such as nitrogen or argon is introduced as a protective gas, the flow rate is 10-200 sccm, the pressure is controlled at 0.1-10 torr, and the heating wire 6 is connected. , rapid heating, the heating rate should be greater than ...

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Abstract

The invention relates to a preparation method of large-dimension high-quality graphene based on self limitation nucleation growth. The method concretely comprises the following steps of preparing a nickel-covered copper substrate; fast raising the temperature in the vacuum protection atmosphere; after the specific growth temperature is reached, introducing process gas to perform graphene growth. In the primary growth period, the surface of the metal is nickel; the nucleation point of the graphene can be effectively controlled. In the growth process, the copper gradually diffuses to the nickel layer to form rich-nickel copper nickel alloy; the fast growth of the nucleation point can be promoted. Along with the continuous increase of the copper ingredients in the surface layer, the large-dimension single crystal formation of the single-layer graphene can be effectively facilitated; meanwhile, the fast growth of single crystals can be maintained; a large-dimension high-quality continuous graphene film can be realized.

Description

technical field [0001] The invention belongs to the technical field of graphene preparation, and relates to a method for preparing large-size and high-quality graphene based on self-limited nucleation and growth. Background technique [0002] As a semiconductor two-dimensional material, graphene has great application potential in many fields. Large-area graphene growth generally uses transition metals as catalysts, and copper-nickel has become the most commonly used substrate due to price reasons. The solubility of carbon atoms in the copper substrate is small, and the carbon atoms produced by catalysis are enriched and nucleated on the copper surface. Therefore, at the beginning of the growth of graphene on the copper substrate, a large number of nucleation points will be formed, making the grown graphene crystals The grains are smaller and there are more grain boundaries in the film. The presence of grain boundaries significantly degrades the performance of graphene film...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B32/186C25D3/12C23C14/16
CPCC01B2204/32C23C14/16C25D3/12
Inventor 张安平杨明超陈家玉赵炎魏葳张晓东
Owner XI AN JIAOTONG UNIV
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