Unlock instant, AI-driven research and patent intelligence for your innovation.

A positive photosensitive resin composition and applications thereof

A technology of photosensitive resin and composition, which is applied in the direction of optics, optomechanical equipment, instruments, etc., can solve the problems of low dielectric strength, low temperature, and unsatisfactory heat resistance of materials, and achieve the effect of good insulation

Active Publication Date: 2018-01-09
CHI MEI CORP
View PDF10 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The material of planarizing film for TFT substrate must have high heat resistance, high transparency, low dielectric property, so this industry usually uses the combination of quinone diazide compound and phenolic resin (such as Japanese Patent Application Publication No. 7-98502 disclosed) or a combination of quinonediazide compound and acrylic resin (as disclosed in Japanese Patent Application Laid-Open No. 10-153854 and Japanese Patent Application Publication No. 2001-281853), but the heat resistance of the aforementioned materials is not ideal. Furthermore, When the substrate is subjected to high temperature treatment, there is also a problem of yellowing of the cured film, resulting in low transparency
[0004] Although various positive-type photosensitive resin compositions for making protective films have been proposed for the above-mentioned required characteristics, the insulation requirements of these materials cannot be accepted by the industry

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A positive photosensitive resin composition and applications thereof
  • A positive photosensitive resin composition and applications thereof
  • A positive photosensitive resin composition and applications thereof

Examples

Experimental program
Comparison scheme
Effect test

Synthetic example A-1

[0206] A nitrogen inlet, a stirrer, a heater, a condenser tube and a thermometer are arranged on a four-neck conical flask with a capacity of 1000 milliliters. After introducing nitrogen, add 20 parts by weight of methacrylic acid (hereinafter referred to as MAA), 35 parts by weight of glycidyl methacrylate (hereinafter referred to as GMA), 30 parts by weight of dicyclopentyl methacrylate (hereinafter referred to as FA-513M), 15 parts by weight of styrene (hereinafter referred to as SM), 5 parts by weight of 2,2'-azobis(2,4-dimethylvaleronitrile) (hereinafter referred to as ADVN) and 300 parts by weight Diethylene glycol dimethyl ether (hereinafter referred to as Diglyme) in parts by weight is put into the reaction bottle. Next, the above ingredients were stirred slowly, and the solution was heated to 70°C. After performing the polycondensation reaction for 4 hours, the solvent was devolatilized to obtain the alkali-soluble resin (A-1) of Synthesis Example A-1.

[0207]

...

Synthetic example B-1-1

[0215] In a dry nitrogen environment, add 0.1 mole of the stilbene compound with a hydroxyl group represented by the aforementioned formula (I-1) and 0.13 mole of o-naphthoquinonediazide-5-sulfonic acid chloride to 450 g of γ-butyrolactone .

[0216] Then, 0.14 mol of triethylamine was dissolved in 50 g of 1,4-dioxane to configure a mixed solution. The mixed solution was added dropwise to the aforementioned γ-butyrolactone solution, and the temperature of the solution was prevented from exceeding 35°C.

[0217] After stirring at 30°C for 2 hours, the precipitated triethylamine salt was filtered, and the filtrate was poured into water.

[0218] Then, the precipitate is collected by filtration, and the precipitate is dried by a vacuum dryer to obtain Synthesis Example B-1-1 having the structure shown in the following formula (I-1-1) and its esterification rate is 65%. :

[0219]

[0220] In formula (I-1-1), Q 1 represent or hydrogen atoms, and the ratio of the two is 1....

Synthetic example B-1-2

[0222] In a dry nitrogen atmosphere, add 0.1 mole of the stilbene compound with a hydroxyl group represented by the aforementioned formula (I-2) and 0.14 mole of o-naphthoquinonediazide-5-sulfonic acid chloride to 450 g of γ-butyrolactone .

[0223] Then, 0.154 mol of triethylamine was dissolved in 50 g of 1,4-dioxane to configure a mixed solution. The mixed solution was added dropwise to the aforementioned γ-butyrolactone solution, and the temperature of the solution was prevented from exceeding 35°C.

[0224] After stirring at 30°C for 2 hours, the precipitated triethylamine salt was filtered, and the filtrate was poured into water.

[0225] Then, the precipitate is collected by filtration, and the precipitate is dried by a vacuum dryer to obtain Synthesis Example B-1-2 with a structure shown in the following formula (I-2-1) and its esterification rate is 70 %:

[0226]

[0227] In formula (I-2-1), Q 2 represent or hydrogen atoms, and the ratio of the two is 1.4:0.6...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present invention relates to a positive photosensitive resin composition and a protective film formed from the positive photosensitive resin composition. The invention relates to a positive photosensitive resin composition for forming a planarizing film for TFT substrate, an interlayer insulating film, or an optical waveguide core material or a clad material; and the protective film has excellent insulation properties. The positive photosensitive resin composition comprises an alkali-soluble resin (A), an o-naphthoquinonediazide sulfonate (B), at least one compound (C) selected from the group consisting of a thermal acid generator and a thermal base generator, a cyclic siloxane compound (D), and a solvent (E).

Description

technical field [0001] The present invention relates to a positive-type photosensitive resin composition suitable for flattening films for TFT substrates, interlayer insulating films, or core materials or cladding materials for optical waveguides, such as liquid crystal display elements and organic EL display elements. And a protective film formed therefrom, and an element having the protective film. Among them, in particular, a positive-type photosensitive resin composition for forming a protective film with good insulating properties after exposure and development is provided. Background technique [0002] In recent years, in the fields of liquid crystal displays or organic electroluminescent displays, in order to improve the clarity and resolution, it is generally achieved by increasing the aperture ratio of the display device (as disclosed in Japanese Patent No. 2933879). By forming a protective film on the planarization film for the transparent TFT substrate, the pixel...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/075
Inventor 黄伟杰吴明儒施俊安
Owner CHI MEI CORP