Crucible and preparation method thereof
A crucible and coating technology, which is applied to the crucible for preparing polysilicon and the preparation field thereof, can solve the problems of weakening the effect of the bottom high-efficiency layer, wide red zone on the side of the silicon wafer, and high local defect density, and achieves uniform and dense structure of the structural layer. The effect of reducing the lateral red zone and dense structure
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0043] The present invention will be described in detail below in conjunction with the accompanying drawings.
[0044] like figure 1 Shown, the present invention provides a kind of crucible, it comprises:
[0045] Crucible body 1;
[0046] The first coating 2, which is provided on the bottom wall and side wall of the crucible body 1, is used to prevent the metal impurities in the crucible body 1 from diffusing into the crystal located in the crucible body 1, affecting the quality of the crystal;
[0047] The second coating 3, which is arranged on the outside of the first coating 2 on the side wall, the second coating 3 is used to assist the nucleation of small grains on the side wall of the crucible body 1, so that the small grains on the side The defect density is low, and the extrusion force on the bottom columnar crystals is small, which provides better vertical growth conditions for the bottom columnar crystals; and
PUM
Property | Measurement | Unit |
---|---|---|
particle diameter | aaaaa | aaaaa |
particle diameter | aaaaa | aaaaa |
particle diameter | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com