A preparation device and method for graphene oxide film multilayer micro-nano pattern
A graphene film and a technology for preparing a device are applied in the directions of microstructure devices, manufacturing microstructure devices, coatings, etc., to achieve the effects of low preparation price, simple production process, and extended application range
Active Publication Date: 2019-11-19
SHANXI UNIV
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Problems solved by technology
[0004] The purpose of the present invention is to solve the technical problem that it is difficult to simultaneously realize the preparation of micro-nano patterns on multi-layer materials, to provide a preparation device and method for multi-layer micro-nano patterns of graphene oxide films, and to realize the preparation of multi-layer graphene oxide films. The writing of any micro-nano pattern on the surface also realizes the continuous adjustment of the fluorescence intensity of graphene oxide by adjusting the laser irradiation power
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[0029] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.
[0030] Such as figure 1As shown, the preparation device of a graphene oxide film multilayer micro-nano pattern in this embodiment includes: a laser 1, an acousto-optic modulator 2, a mirror 3, a beam expander 4, an aperture 5, a dichroic Mirror 6, objective lens 7, three-dimensional precision displacement table 9, emission color filter 10, lens 11, photoelectric detector 12 and computer 13; The laser device 1 is a continuous laser device with a wavelength of 405nm, and the maximum laser power is 100mW. The light modulator 2 is arranged on the outgoing optical path of the laser 1, the reflector 3 is arranged on the outgoing optical path of the acousto-optic modulator 2, and the beam expander 4, the diaphragm 5 and the dichroic mirror 6 are arranged on the reflecting mirror in turn. On the reflective optical path of the mirror 3, the objective lens 7 and...
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Abstract
The invention relates to a preparation device and method of graphene oxide film multi-layer micro-nano graphics, aiming at solving the technical problem that the preparation of micro-nano graphics canbe difficultly implemented on multi-layer materials at the same time. The technical scheme of the invention is that the preparation device of the graphene oxide film multi-layer micro-nano graphics comprises a laser, an acoustic optical modulator, a reflector, a beam expander, a diaphragm, a dichroscope, an objective lens, a 3D precision displacement table, an emission color filter, a lens, a photoelectric detector and a computer. According to the preparation method of the graphene oxide film multi-layer micro-nano graphics disclosed by the invention, graphene oxide and transparent polyvinylalcohol are taken as raw materials, the operation of performing laser-controlled reduction on graphene oxide to obtain a specific fluorescence intensity is taken as a method, the writing of any micro-nano graphics on multi-layer graphene oxide films can be realized, the structural form of the film is not changed, the simultaneous preparation of the multi-layer micro-nano graphics can be implemented, a simple preparation process and a low preparation cost can be achieved, and an application range of the micro-nano graphics can be extended.
Description
technical field [0001] The invention belongs to the field of optics and micro-nano pattern preparation, and in particular relates to a preparation device and method of graphene oxide film multilayer micro-nano pattern. Background technique [0002] The preparation of micro-nano structures and patterns with different conductivity and refractive index on the surface of materials has always been the focus of research in the fields of microelectronics, high-resolution display, and information storage. With the rapid development of micro-nano science and etching technology in recent years, this This kind of micro-nano structure and pattern has been widely used in optoelectronic devices such as microcircuits, optical display devices, and solar cells. Traditionally, corresponding masks are made according to specific image requirements, and then micro-nano structures are prepared by photoresist and vapor deposition. This preparation method is complicated in process, demanding in co...
Claims
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Login to View More IPC IPC(8): B81C1/00B82Y30/00B82Y40/00
CPCB81C1/00523B81C2201/0143B82Y30/00B82Y40/00
Inventor 秦成兵乔志星张国峰肖连团贾锁堂
Owner SHANXI UNIV