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Acidic copper chloride etching liquid in-situ electrolytic regeneration and copper recycling method

A technology of electrolysis regeneration and recovery method, which is applied in the direction of electrolysis process, electrolysis components, electrodes, etc. It can solve the problems of complicated technical process and operation, chlorine and hydrogen precipitation operation, and the need for centrifugation and dehydration, so as to increase the reaction area and avoid precipitation. Chlorine, simple operation effect

Inactive Publication Date: 2018-03-23
TIANJIN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Jiang Yusi and others [8] Using a cation exchange membrane electrolytic cell with a small cathode and a large anode and distributing the etching waste liquid to the anode chamber and the cathode chamber respectively to process the acidic copper chloride etching solution can successfully regenerate the etching solution and recover copper powder, but chlorine gas is precipitated in the electrolysis and hydrochloric acid consumption
Xu Haiqing and others [9] An anion exchange membrane electrolytic cell with a small cathode and a large anode is used to treat the acidic copper chloride etching solution in a manner of intermittent operation and four-step current reduction. The etching solution can be regenerated and the copper plate can be recovered, but chlorine and hydrogen gas are still precipitated and the operation is complicated.
[0006] The reported electrolytic treatment of acidic copper chloride etching solution may cause harmful and dangerous gases such as chlorine and hydrogen to be precipitated, or the recovery of copper in the form of copper powder may require centrifugal dehydration, or the technical process and operation are complicated

Method used

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  • Acidic copper chloride etching liquid in-situ electrolytic regeneration and copper recycling method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0052] The composition of the initial cathodic solution is: CuCl 2 0.34mol / L, CuCl 0.16mol / L, NaCl 2mol / L, HCl 2mol / L. When the electrolytic regeneration and copper recovery system is in operation, the etching liquid stream 4 with a flow rate of 16.9 (Q) L / h and the catholyte branch stream 11 with a flow rate of 0.53 L / h (0.03 Q) are combined and used as the anode liquid stream 5 into the anode chamber 1 for regeneration. The anode outflow stream 6 is divided into a regenerated etchant stream 7 and a regenerated etchant branch 8 with a flow rate of 0.53L / h (0.03Q). The regenerated etching liquid branch stream 8 and the cathodic discharge stream 9 merge to form the cathode outdoor circulation stream 12, and the cathode outdoor circulation stream is divided into the catholyte branch stream 11 and the flow rate of 0.53L / h (0.03Q). The cathode inflow stream 10 of 3.96 L / h (0.23Q), the cathode inflow stream 10 enters the cathode chamber for copper deposition.

[0053] The appar...

Embodiment 2

[0055] The composition of the initial cathodic solution is: CuCl 2 0.50mol / L, CuCl 0.14mol / L, NaCl 2mol / L, HCl 2mol / L. When the electrolytic regeneration and copper recovery system is in operation, the etching liquid stream 4 with a flow rate of 17.0 (Q) L / h and the catholyte branch stream 11 with a flow rate of 0.60 L / h (0.035 Q) are merged and then used as the anode liquid stream 5 into the anode chamber 1 for regeneration. The anode outflow stream 6 is divided into a regenerated etchant stream 7 and a regenerated etchant branch 8 with a flow rate of 0.60L / h (0.035Q). The regenerated etching liquid branch stream 8 and the cathodic discharge stream 9 merge to form the cathode outdoor circulation stream 12, and the cathode outdoor circulation stream is divided into the catholyte branch stream 11 and the flow rate of 0.60L / h (0.035Q). 6.48L / h (0.38Q) of the cathode inflow stream 10, the cathode inflow stream 10 enters the cathode chamber for copper deposition.

[0056] The ...

Embodiment 3

[0058] The composition of the initial cathodic solution is: CuCl 2 0.40mol / L, CuCl 0.15mol / L, NaCl 2mol / L, HCl 2mol / L. When the electrolytic regeneration and copper recovery system is in operation, the etching liquid stream 4 with a flow rate of 20.1 (Q) L / h and the catholyte branch stream 11 with a flow rate of 0.67 L / h (0.033 Q) are combined and used as the anode liquid stream 5 into the anode chamber 1 for regeneration. The anode outflow stream 6 is divided into a regenerated etchant stream 7 and a regenerated etchant branch 8 with a flow rate of 0.67L / h (0.033Q). The regenerated etching liquid branch stream 8 and the cathodic discharge stream 9 merge to form the cathode outdoor circulation stream 12, and the cathode outdoor circulation stream is divided into the catholyte branch stream 11 and the flow rate of 0.67L / h (0.033Q). The cathode inflow stream 10 of 9.36L / h (0.47Q), the cathode inflow stream 10 enters the cathode chamber for copper deposition.

[0059] The app...

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Abstract

The invention belongs to the technical field of printed circuit board etching machining and discloses an acidic copper chloride etching liquid in-situ electrolytic regeneration and copper recycling method. An anode liquid feeding stream flows into an anode chamber of an electrolytic tank, and an anode liquid discharging stream flows out of the anode chamber of the electrolytic tank; a cathode liquid feeding stream flows into a cathode chamber of an electrolytic tank, and a cathode liquid discharging stream flows out of the cathode chamber of the electrolytic tank; the anode liquid dischargingstream is divided into a regeneration etching liquid stream and a regeneration etching liquid branch stream; the cathode liquid feeding stream and the cathode liquid discharging stream form a cathodeoutdoor circulation stream to circulate outside the cathode chamber; the regeneration etching liquid branch stream is gathered into a cathode outdoor circulating stream; the cathode outdoor circulating stream is split to form a cathode liquid branch stream; and the cathode liquid branch stream is gathered into an etching liquid stream to serve as the anode liquid feeding stream to enter the anodechamber for regeneration. The acidic copper chloride etching liquid is regenerated through a simple single electrolytic tank process, gas precipitation and consumption of hydrochloric acid are avoidedin the electrolytic process, copper is recycled in a high-purity copper board mode, the production efficiency is improved, resources are fully used, and the environment is protected.

Description

technical field [0001] The invention belongs to the technical field of printed circuit board etching processing, and specifically relates to a method for electrolytic regeneration of acidic copper chloride etching solution and copper recovery. Background technique [0002] Printed circuit boards are the basic components of various electronic products. An important part of the production process is to use chemical etching to etch away the excess copper (generally 60-70%) that is not required by the circuit on the copper foil board. Acidic copper chloride etchant and alkaline copper chloride etchant are currently the most used etchant, among which acidic copper chloride etchant is especially suitable for printed circuit board products with high etching precision requirements due to its characteristics of small side etching, and is used by a large number of Printed circuit board factories are increasingly used. The chemical reaction that occurs during the etching process is th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25C1/12C23F1/46C25C7/02
CPCC23F1/46C25C1/12C25C7/02Y02P10/20
Inventor 王宇新常艳刘梦真张文黄成德
Owner TIANJIN UNIV
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