Flexible transparent circuit manufacturing method
A transparent and circuit technology, applied in the direction of transparent dielectric, printed circuit manufacturing, printed circuit, etc., can solve the problems of complex process, leakage of liquid metal, opaque conductive material, etc., to achieve simple preparation process, excellent conductivity, excellent bending resistance Effect
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Embodiment 1
[0036] The silver nanowire (AgNWs) ethanol solution used in the present invention has the following specifications: diameter 30nm, length 100-200um, concentration 20mg / ml, solvent is absolute ethanol.
[0037] (1) Preparation of circuit template
[0038] Using photolithography technology, use SU-2050 photoresist to carve a circuit with a protruding surface structure on a 4-inch silicon wafer to obtain a circuit template.
[0039] (2) Preparation of PDMS transparent carrier
[0040] Mix liquid A and liquid B of polydimethylsiloxane (Polydimethylsiloxane, PDMS) evenly in a ratio of 10:1, pour it onto a template made of a silicon wafer with a photoetched circuit pattern, and put it in a vacuum desiccator The air bubbles in the PDMS were pumped out for about 1 hour, and then heated and cured in an oven at 80°C for 1 hour to obtain a cured transparent PDMS carrier with circuit grooves.
[0041](3) Preparation of flexible transparent circuits
[0042] A. Configure AgNWs ethanol s...
Embodiment 2
[0046] The copper nanowire (CuNWs) ethanol solution used in the present invention has the following specifications: diameter 20nm, length 80um, concentration 20mg / ml, solvent is absolute ethanol.
[0047] (1) Preparation of circuit template
[0048] Using photolithography technology, use SU-2050 photoresist to carve out the template of the required circuit on the 4-inch silicon wafer.
[0049] (2) Preparation of PDMS transparent carrier
[0050] Mix liquid A and liquid B of polydimethylsiloxane (Polydimethylsiloxane, PDMS) evenly in a ratio of 10:1, pour it onto a template made of a silicon wafer with a photoetched circuit pattern, and put it in a vacuum desiccator The air bubbles in the PDMS were pumped out for 1 hour, and then heated and cured in an oven at 80°C for 1 hour to obtain a PDMS transparent carrier with circuit grooves.
[0051] (3) Preparation of flexible transparent circuits
[0052] A. Prepare CuNWs ethanol solution 0.4mg / ml.
[0053] B. Take 60uL of CuNWs ...
Embodiment 3
[0056] The gold nanowire (AuNWs) ethanol solution used in the present invention has the following specifications: diameter 3nm, length 50um, concentration 20mg / ml, solvent is absolute ethanol.
[0057] (1) Preparation of circuit template
[0058] Using photolithography technology, use SU-2050 photoresist to carve out the template of the required circuit on the 4-inch silicon wafer.
[0059] (2) Preparation of PDMS transparent carrier
[0060] Mix liquid A and liquid B of polydimethylsiloxane (Polydimethylsiloxane, PDMS) according to the ratio of 10:1, pour it into a mold made of a silicon wafer with a photoetched circuit pattern, and put it in a vacuum desiccator The air bubbles in the PDMS were pumped out, and it took about 1 hour, and then heated and cured in an oven at 80°C for 1 hour to obtain a PDMS transparent carrier with circuit grooves.
[0061] (3) Preparation of flexible transparent circuits
[0062] A. Prepare AuNWs ethanol solution 0.5mg / ml.
[0063] B. Take 3...
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