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A method for active control of surface potential of dielectric material in high vacuum environment

A dielectric material and surface potential technology, applied in electrical components, plasma, aerospace safety/emergency devices, etc., can solve the problems of high energy consumption and solid material consumption, achieve low temperature, long life, and increase the availability of large space scales operational effect

Active Publication Date: 2020-06-05
ARMY ENG UNIV OF PLA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The Russian Mir space station uses a pulsed plasma source to neutralize the surface charge of the dielectric material in space. It has the characteristics of simple structure, high neutralization efficiency, and stable operation. However, the pulsed plasma source decomposes the surface material of the working medium by high-temperature arc ablation Combined ionization to generate plasma, high energy consumption and consumption of solid materials

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  • A method for active control of surface potential of dielectric material in high vacuum environment
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  • A method for active control of surface potential of dielectric material in high vacuum environment

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Embodiment Construction

[0030] The technical solutions in the embodiments of the present invention are clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0031] In the following description, a lot of specific details are set forth in order to fully understand the present invention, but the present invention can also be implemented in other ways different from those described here, and those skilled in the art can do it without departing from the meaning of the present invention. By analogy, the present invention is therefore not limited to the specific examples disclosed below.

[0032] The invention di...

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Abstract

The invention discloses a method for actively controlling the surface potential of a dielectric material in a high-vacuum environment. The discharge process is carried out in a high-vacuum environment. The discharge process includes using a microwave power supply to supply power to a magnetron to generate 2.45GHz electromagnetic waves. The electromagnetic waves are in TEM mode. It is fed through the coaxial waveguide and fed into the microwave coaxial antenna through the microwave transmission system. The lower end of the microwave coaxial antenna is located in the plasma chamber of the plasma source body. The body completes the electricity elimination process in the vacuum chamber; in a high vacuum environment, the microwave coaxial antenna breaks down the working gas in the plasma chamber to form plasma, and the ring-shaped permanent magnet steel located in the plasma chamber is used to generate 0.0875 Tess The magnetic field is pulled, and a high-density electron cyclotron resonance plasma is formed under the action of the magnetic field, which diffuses into the environment of the workpiece to be processed through the plasma regulating plate, and realizes the active adjustment of the surface charge of the medium.

Description

technical field [0001] The invention belongs to the field of scientific research on the interaction between plasma and materials, and in particular relates to an active control method for the surface potential of a dielectric material in a high-vacuum environment. Background technique [0002] During the operation of the spacecraft in orbit, its surface is affected by space plasma, high-energy electrons, solar radiation, space charged dust and other environments, and electrostatic charge accumulation and leakage may occur. This charging and discharging process may cause the breakdown of spacecraft materials, the degradation of material surface properties, and the performance degradation or damage of solar cells, electronic devices, and optical sensors; at the same time, the strong electromagnetic pulses generated by this charging and discharging process will seriously interfere with spaceflight. Abnormalities, failures, failures, and even scrapping of the spacecraft will ser...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H05H1/46B64G1/52
CPCB64G1/52H05H1/46H05H1/461
Inventor 原青云陈龙威张希军孙永卫任兆杏代银松
Owner ARMY ENG UNIV OF PLA
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