High-stability silicon dioxide microspheres and preparation method and application thereof
A silicon dioxide, high-stability technology, applied in the direction of silica, silicon oxide, cosmetic preparations, etc., can solve the problems of application limitations, dispersion stability of silica microspheres, insufficient stability, etc., to achieve high The effect of stability
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Embodiment 1
[0025] A method for preparing high-stability silica microspheres in this example, the specific steps are: slowly add 2.5 g of tetraethyl orthosilicate dropwise into a mixed solvent of 100 g of ethanol and 200 g of water, and stir at room temperature for 1 h. Then, 8 g of concentrated ammonia water (28 wt.%) and 0.15 g of polyquaternium-64 were added, and stirring was continued for 4 h at room temperature to complete the reaction. The reaction solution was concentrated to obtain a white precipitate, which was centrifuged, washed several times, and dried to obtain 0.47 g of silica microspheres. Its transmission electron microscope pictures are shown in figure 1 , it can be seen that the average particle size is 2 μm. At a temperature of 48°C, it was dispersed in deionized water, 0.1M saline and 5wt.% AES solution at a concentration of 1 mg / mL, and the stability data are shown in Table 1.
Embodiment 2
[0027] A method for preparing high-stability silica microspheres in this example, the specific steps are: slowly add 2.5 g of isopropyl orthosilicate dropwise into a mixed solvent of 100 g of ethanol and 200 g of water, and stir at room temperature for 1 h. Then, 8 g of concentrated ammonia water (28 wt.%) and 0.15 g of polyquaternium-64 were added, and stirring was continued for 4 h at room temperature to complete the reaction. The reaction solution was concentrated to obtain a white precipitate, which was centrifuged, washed several times, and dried to obtain 0.41 g of silica microspheres. At a temperature of 48°C, it was dispersed in deionized water, 0.1M saline and 5wt.% AES solution at a concentration of 1 mg / mL, and the stability data are shown in Table 1.
Embodiment 3
[0029] A method for preparing high-stability silica microspheres in this example, the specific steps are: slowly add 2.5 g of tetraethyl orthosilicate dropwise into a mixed solvent of 125 g of ethanol and 175 g of water, and stir at room temperature for 1 h. Then, 8 g of concentrated ammonia water (28 wt.%) and 0.15 g of polyquaternium-64 were added, and stirring was continued for 4 h at room temperature to complete the reaction. The reaction solution was concentrated to obtain a white precipitate, which was centrifuged, washed several times, and dried to obtain 0.38 g of silica microspheres. At a temperature of 48°C, it was dispersed in deionized water, 0.1M saline and 5wt.% AES solution at a concentration of 1 mg / mL, and the stability data are shown in Table 1.
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