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Preparation method of lanthanum strontium manganese oxide film with negative poisson's ratio

A lanthanum strontium manganese oxide thin film, negative Poisson's ratio technology, applied in metal material coating process, vacuum evaporation coating, coating and other directions, to achieve the effect of low roughness, low cost and great application value

Inactive Publication Date: 2018-06-01
SHENZHEN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Device La 0.7 Sr 0.3 MnO 3 The Poisson's ratio of the film is usually positive, which is difficult to meet the needs of the industry at this stage, so La with a negative Poisson's ratio is prepared 0.7 Sr 0.3 MnO 3 Thin films can effectively solve these problems

Method used

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  • Preparation method of lanthanum strontium manganese oxide film with negative poisson's ratio
  • Preparation method of lanthanum strontium manganese oxide film with negative poisson's ratio
  • Preparation method of lanthanum strontium manganese oxide film with negative poisson's ratio

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] (1) the used SrTiO 3 (001) The substrate is ultrasonically cleaned in acetone, absolute ethanol, and deionized water in sequence;

[0030] (2) La 0.7 Sr 0.3 MnO 3 The target material and the substrate in step (1) are put into the pulsed laser deposition equipment;

[0031] (3) Carry out vacuum operation on the pulse laser deposition equipment to reach a high vacuum state of 1×10 -4 Pa, after the vacuum degree is reached, the substrate is heated, and the heating temperature is 720°C;

[0032] (4) The pulsed laser deposition equipment in the high vacuum state obtained in step (3) is subjected to a flow oxygen circulation operation, and the oxygen pressure is 1×10 -2 Pa;

[0033] (5) Depositing the pulsed laser deposition equipment in step (4), the laser pulse width is 10ns, the laser energy is 180 mJ, and the laser frequency is 3Hz; the deposition time is 5min, and the thickness is 10nm. 0.7 Sr 0.3 MnO 3-δ film;

[0034] (6) Carry out XRD test to gained film, i...

Embodiment 2

[0040] The difference with embodiment 1 is:

[0041] (1) the used SrTiO 3 (001) The substrate is ultrasonically cleaned in acetone, absolute ethanol, and deionized water in sequence;

[0042] (2) La 0.7 Sr0.3 MnO 3 The target material and the substrate in step (1) are put into the pulsed laser deposition equipment;

[0043] (3) Carry out vacuum operation on the pulse laser deposition equipment to reach a high vacuum state of 1×10 -4 Pa, after the vacuum degree is reached, the substrate is heated, and the heating temperature is 730°C;

[0044] (4) The pulsed laser deposition equipment in the high vacuum state obtained in step (3) is subjected to a flow oxygen circulation operation, and the oxygen pressure is 1×10 -2 Pa;

[0045] (5) Depositing the pulsed laser deposition equipment in step (4), the laser pulse width is 10ns, the laser energy is 180 mJ, and the laser frequency is 3Hz; the deposition time is 15min, and the thickness is 68nm. 0.7 Sr 0.3 MnO 3-δ film;

[...

Embodiment 3

[0053] The difference with embodiment 1 is:

[0054] (1) the used SrTiO 3 (001) The substrate is ultrasonically cleaned in acetone, absolute ethanol, and deionized water in sequence;

[0055] (2) La 0.7 Sr 0.3 MnO 3 The target material and the substrate in step (1) are put into the pulsed laser deposition equipment;

[0056] (3) Carry out vacuum operation on the pulse laser deposition equipment to reach a high vacuum state of 1×10 -4 Pa, after the vacuum degree is reached, the substrate is heated, and the heating temperature is 730°C;

[0057] (4) The pulsed laser deposition equipment in the high vacuum state obtained in step (3) is subjected to a flow oxygen circulation operation, and the oxygen pressure is 1×10 -2 Pa;

[0058] (5) Depositing the pulsed laser deposition equipment in step (4), the laser pulse width is 10ns, the laser energy is 150mJ, and the laser frequency is 3Hz; the deposition time is 25min, and the thickness is 78nm. 0.7 Sr 0.3 MnO 3-δ film;

...

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Abstract

The invention discloses a preparation method of a lanthanum strontium manganese oxide film with the negative poisson's ratio, and belongs to the technical field of electronic films. The method comprises the steps that a substrate is cleaned, the substrate and the target material La0.7Sr0.3MnO3 are placed into pulse laser deposition equipment, the vacuum state, substrate heating temperature and flow oxygen pressure of the pulse laser deposition equipment are controlled, deposition is carried out, and the La0.7Sr0.3MnO3-delta film is obtained. Since a film grows on the SrTiO3 substrate, the filmis subjected to the pulling stress effect, meanwhile, the manganese oxide octahedron of the La0.7Sr0.3MnO3-delta film is expanded, and the La0.7Sr0.3MnO3-delta film with the negative poisson's ratiois obtained. Laser energy adopted in the method is low, the technology is simple, the cost is low, the efficiency is high, and operability is high.

Description

technical field [0001] The invention relates to a preparation method of a negative Poisson's ratio lanthanum strontium manganese oxide thin film, which belongs to the technical field of electronic thin films. Background technique [0002] Since 1987, when the scientist Lakes heated, cooled and relaxed polyurethane foam, and obtained a material with a negative Poisson's ratio of -0.7, people started extensive research in this field. A material with a negative Poisson's ratio means that the material expands laterally within the elastic range when stretched, and compresses laterally within the elastic range when compressed. There is no negative Poisson's ratio effect found in common thin film materials. Negative Poisson's ratio materials can strengthen the shear modulus of the material, increase the plane strain fracture toughness, increase the indentation resistance, and so on. These singular properties make negative Poisson's ratio materials have broad application value. Fo...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/08C23C14/28
CPCC23C14/08C23C14/28
Inventor 黄传威金菲陈善全
Owner SHENZHEN UNIV
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