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Method for improving performance of AlTiSiN coating through low-negative bias high-energy Ar <+> etching cleaning

A negative bias, high-energy technology, applied in coating, metal material coating process, ion implantation plating, etc., can solve problems such as increasing power supply requirements, large cleaning negative bias, etc., to improve cutting performance and improve film base. The effect of bonding force, improved friction and wear resistance and cutting performance

Active Publication Date: 2018-06-15
安徽工业大学科技园有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The disadvantage of this kind of cleaning is that metal ions are easy to form metal droplets on the surface of the tool substrate, or a large cleaning negative bias (-800V ~ -1200V) is required, which increases the requirements for power supply

Method used

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  • Method for improving performance of AlTiSiN coating through low-negative bias high-energy Ar &lt;+&gt; etching cleaning
  • Method for improving performance of AlTiSiN coating through low-negative bias high-energy Ar &lt;+&gt; etching cleaning
  • Method for improving performance of AlTiSiN coating through low-negative bias high-energy Ar &lt;+&gt; etching cleaning

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] Such as figure 1 As shown, there are one columnar Ti target 2 for high-energy ion cleaning and six targets 3 for coating deposition distributed in the chamber 1 of the vacuum furnace in this embodiment. When the furnace reaches a high vacuum, the cylindrical Ti target 2 is turned on to ionize a large amount of Ti ions, and at the same time, argon gas is introduced to excite the Ar + Etching and cleaning the substrate, 4 in the figure is the workpiece.

[0027] When the vacuum degree in the furnace reaches 2.0×10 -4 At Pa, Ar gas with a purity of 99.999% was introduced and heated to 450°C. Turn on the cylindrical Ti target as a traction arc target, control the current during cleaning to 40A, and generate a large number of electrons. Turn on the circular auxiliary anode target to form positive and negative pull electron movement with the Ti target. Electrons collide with Ar gas in the furnace to produce high-density Ar + . The negative bias of the substrate is -180V...

Embodiment 2

[0033] The high-energy Ar of this embodiment + During the ion etching process, the arc cleaning current of the Ti column was controlled to be 70A, and the substrate cleaned by ion etching and the prepared coating were tested.

[0034] Other implementations are the same as in Example 1.

Embodiment 3

[0036] The high-energy Ar of this embodiment + During the ion etching process, the arc cleaning current of the Ti column was controlled to be 100A, and the substrate cleaned by ion etching and the prepared coating were tested.

[0037] Other implementations are the same as in Example 1.

[0038]The detailed cleaning and deposition process parameters of the coatings of each embodiment are shown in Table 1.

[0039] Table 1 Detailed cleaning and deposition process parameters of AlTiSiN coating

[0040]

[0041] After the samples of each embodiment are prepared, related tests are carried out, and the test results of the AlTiSiN coating are shown in Table 2.

[0042] Table 2 Test results of AlTiSiN coating

[0043]

[0044] figure 2 Ar under different cleaning current conditions + Surface SEM and three-dimensional topography of the substrate after etching treatment. Depend on figure 2 (a) and (d), it can be found that when the cleaning current is 40A, the Ar + Afte...

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Abstract

The invention discloses a method for improving performance of an AlTiSiN coating through low-negative bias high-energy Ar <+> etching cleaning. The method comprises the steps that a multi-arc ion plated vacuum furnace is vacuumized, then, Ar gas is introduced and is heated to 450 DEG C, a cleaning Ti target is started, then, an anode target material is started, the cleaning Ti target and the anodetarget material perform positive-negative traction electron motion, Ar <+> is generated through collision of electrons and the Ar gas, negative bias is controlled to be minus 180 V, and Ar <+> is attracted to perform ion bombardment on the surface of a substrate for 30 min; and the AlTiSiN composite coating is deposited on the treated substrate. According to the method, the substrate is subjectedto etching cleaning through only high-energy Ar ions in the low-negative bias condition, the film-substrate binding force of the AlTiSiN coating can be remarkably improved through the etching cleaning technology, wear and friction resistance and cutting performance of the coating are improved, and the coating is applicable to a harsh high-hardness material high-speed cutting environment, and hasgreat application prospects in the field of cutter and surface protection.

Description

technical field [0001] The invention relates to a technology for cleaning the surface of a substrate before coating, in particular to a low negative bias high energy Ar + Method of etch cleaning to improve the properties of AlTiSiN coatings. Background technique [0002] Hard coatings have been used more and more widely on cutting tools. Statistics show that more than 85% of the surface of cemented carbide tools is coated, and this proportion will continue to increase in the next few years. At the same time, the processed workpiece and environmental protection issues have put forward higher requirements for cutting processing: faster cutting speed, higher workpiece surface quality and less or even no cutting fluid used in the cutting process. However, it is difficult to meet the above requirements without coating treatment and only relying on the cemented carbide tool itself. Therefore, scholars at home and abroad have conducted extensive research on the design of tool co...

Claims

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Application Information

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IPC IPC(8): C23C14/02C23C14/06C23C14/32
CPCC23C14/0021C23C14/022C23C14/0641C23C14/325
Inventor 蔡飞方炜张世宏陈默含张林杨英
Owner 安徽工业大学科技园有限公司
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