Preparation method of super-hydrophobic super-oleophobic polymer nano-coating
A super-hydrophobic, super-oleophobic, and nano-coating technology, which is applied in coatings and other directions, can solve problems such as high equipment requirements, high energy consumption, and high pyrolysis temperature, and achieve excellent performance effects
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[0028] Example 1
[0029] Place the pretreated glass sheet as the base material on the sample stage in the cavity, and fix the base so that it is in full contact with the bottom surface. Turn on the mechanical pump to pump the chamber to a vacuum state. Heating initiator perfluorobutanesulfonyl fluoride, reactive monomer 1H,1H,2H,2H-perfluorodecyl acrylate, crosslinking agent 2,4,6-trivinyl-2,4,6-trimethyl Cyclotrisiloxane; monomer and crosslinking agent flow rates are 0.1sccm and 10sccm respectively; initiator flow rate is 0.5sccm; cavity pressure is 100mTorr; hot wire temperature is 150°C; substrate temperature is 20°C; hot wire The distance between the warm-up source and the base material is 1cm; the deposition thickness is 100nm; the deposition time is 20min; and the deposition rate is 5nm / min. Such as figure 1 As shown, the figure is the Fourier infrared spectrum of the polymer nano-coating film obtained through the process conditions of Example 1. It can be seen from this...
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[0030] Example 2
[0031] The base material in Example 1 was changed to cotton cloth; the monomer flow rate and the crosslinking agent flow rate were changed to 5 sccm and 5 sccm; the initiator was changed to tert-butyl benzoyl peroxide, and the initiator flow rate was 5 sccm; other conditions remained unchanged. The deposition thickness is 100nm; the deposition time is 15min; and the deposition rate is 6.7nm / min.
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[0032] Example 3
[0033] The base material in Example 1 was changed to PDMS membrane; the monomer flow rate and the crosslinking agent flow rate were changed to 10 sccm and 0.1 sccm; the initiator was changed to perfluorooctyl sulfonyl fluoride, and the initiator flow rate was 10 sccm. Other conditions remain unchanged, the deposition thickness is 100nm; the deposition time is 10min; and the deposition speed is 10nm / min.
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