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Metamaterial manufacturing method

A manufacturing method and metamaterial technology, applied in the field of metamaterials, can solve the problems of low processing accuracy, high cost, poor implementability, etc., and achieve the effects of good electromagnetic corresponding characteristics, high manufacturing efficiency, and strong implementability.

Inactive Publication Date: 2018-07-10
SHENZHEN KUANG CHI SPACE TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] (1) Although the lithography and lithography process have high processing precision, the cost is high and the process is complicated
In addition, lithography is difficult to realize the processing of metamaterial microstructures on flexible substrates, thus limiting the application of metamaterials in specific fields (such as curved surfaces and special surfaces)
[0005] (2) Screen printing and inkjet printing technologies can realize the preparation of large-area metamaterials, but also require high-cost instruments (high-precision screen printing machines, high-precision inkjet printers)
[0006] In summary, the existing metamaterial manufacturing process has the disadvantages of high processing cost, poor implementability, and low processing accuracy, which cannot meet the requirements of metamaterial technology.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0043] In step S01, see figure 1 , to prepare the soft template 2 with the reverse pattern of the microstructure of the metamaterial 1.

[0044] Specifically, the soft template 2 is a PDMS template, which is made of PDMS, that is, polydimethylsiloxane material, which has good flexibility and low surface energy, so that its surface is opposite to, for example, octadecane Materials such as trichlorosilane (OTS) have less adhesion. The preparation of the soft template 2 can adopt a photolithography method to form a pattern opposite to the microstructure on the surface of a hard substrate. Resist, wherein the part corresponding to the microstructure is left blank, while the other part is set as photoresist. like image 3 As shown, the pattern formed on the surface of the hard substrate is a plurality of split ring-shaped grooves 21 defined by photoresist that match the shape and size of the split resonant ring 131 . After the hard substrate with the patterned photoresist is ob...

Embodiment 2

[0061] In step S01, a soft template 2 having a pattern opposite to the microstructure of the metamaterial 1 is prepared.

[0062] Specifically, the soft template 2 is a PDMS template, which is made of PDMS, that is, polydimethylsiloxane material, which has good flexibility and low surface energy, so that its surface is opposite to, for example, octadecane Materials such as trichlorosilane (OTS) have less adhesion. The preparation of the soft template 2 can adopt a photolithography method to form a pattern opposite to the microstructure on the surface of a hard substrate. The pattern opposite to the microstructure in this embodiment refers to setting patterned light on the surface of the hard substrate Resist, wherein the part corresponding to the microstructure is left blank, and the other part is set as photoresist. In this embodiment, the pattern formed on the surface of the hard substrate is matched with the shape and size of the split resonator ring 131 A plurality of ope...

Embodiment 3

[0079] In step S01, a soft template 2 having a pattern opposite to the microstructure of the metamaterial 1 is prepared.

[0080] Specifically, the soft template 2 is a PDMS template, which is made of PDMS, that is, polydimethylsiloxane material, which has good flexibility and low surface energy, so that its surface is opposite to, for example, octadecane Materials such as trichlorosilane (OTS) have less adhesion. The preparation of the soft template 2 can adopt a photolithography method to form a pattern opposite to the microstructure on the surface of a hard substrate. The pattern opposite to the microstructure in this embodiment refers to setting patterned light on the surface of the hard substrate Resist, in which the part corresponding to the microstructure is left blank, while the other part is set as photoresist such as image 3 As shown, the pattern processed on the surface of the hard substrate is a plurality of split ring-shaped grooves 21 defined by photoresist tha...

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Abstract

The invention relates to a metamaterial manufacturing method, which comprises the steps of a, preparing a soft template with the pattern being opposite to that of a microstructure of a metamaterial; b, forming an OTS self-assembled monolayer with the pattern being the same as that of the microstructure on the soft template; c, preparing a composite substrate, and performing technology processing for improving the surface energy on the composite substrate; d, tightly attaching the OTS self-assembled monolayer side of the soft template with the OTS self-assembled monolayer formed in the step b to the technology processed surface of the composite substrate in the step c, maintaining the attachment for a certain time until the OTS self-assembled monolayer is transferred from the soft templateto the composite substrate, and then taking down the soft template so as to obtain a patterned composite substrate; and e, depositing gold nanoparticles in a non-patterned region of the patterned composite substrate to form a microstructure pattern. The metamaterial manufacturing method is high in implementation and high in manufacturing efficiency. In addition, the obtained microstructure is accurate in structural size and has excellent electromagnetic corresponding characteristics.

Description

technical field [0001] The present invention relates to the technical field of metamaterials, and more specifically, to a method for manufacturing metamaterials. Background technique [0002] At present, the processing of metamaterials mainly relies on photolithography technology and other planar etching processes (such as ion beam etching, electron beam etching, X-ray etching, etc.). Compared with these technologies, screen printing, inkjet printing, etc. prepare metamaterials through solution processing, which is compatible with the roll-to-roll process, and is a more potential metamaterial manufacturing process. [0003] Metamaterials are composed of dielectric substrates and microstructures. The key technology in the manufacture of metamaterials is the processing of microstructures. The existing defects in the manufacturing process are as follows: [0004] (1) Although the photolithography and lithography processes have high processing precision, the cost is high and th...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01B13/00
CPCH01B13/00
Inventor 不公告发明人
Owner SHENZHEN KUANG CHI SPACE TECH CO LTD
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