a cr 2 Coating preparation method with controllable purity of alc phase
A technology of coating and purity, which is applied in the direction of coating, metal material coating process, vacuum evaporation plating, etc., can solve problems such as constraints and unknown purity of Cr2AlC phase, and achieve the effect of improving the limitation of temperature dependence
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0025] In the present embodiment, the preparation process of substrate surface coating is as follows:
[0026] (1) After cleaning and drying the substrate, put it into a vacuum coating chamber, pass argon gas with a flow rate of 100 sccm into the vacuum chamber, apply a negative bias voltage of -350V to the substrate to generate glow, and use the glow to etch the substrate for 40 minutes;
[0027] (2) Using Cr 2 Al target and pure Al target are co-sputtered, and the substrate is placed on Cr 2 The Al target rotates directly in front of it, and argon and hydrocarbon gas are introduced into the cavity as reaction gases, CH 4 Flow rate is 200sccm, Ar flow rate is 80sccm, air pressure is 4.0mTorr, Cr 2 The sputtering current of the Al target is 2.5A, the sputtering current of the Al target is 0.5A, and a coating containing three elements of Cr, Al, and C is deposited on the surface of the substrate, with a thickness of 5um;
[0028] (3) The deposited coating is subjected to vac...
Embodiment 2
[0032] In this embodiment, the substrate is the same as that in Embodiment 1. The preparation process of substrate surface coating is basically the same as that in Example 1, except that in step (2), Cr 2 The Al target sputtering current is 2.5A, and the Al target sputtering current is 1A.
[0033]Adopt EDS energy spectrum to measure chromium, aluminum element content in the coating that above-mentioned makes, obtain that Cr / Al ratio is 2.09 in this coating, as figure 1 shown.
[0034] Measure the XRD spectrum of the coating made above, such as figure 2 As shown, the phase composition and the content of each phase of the coating are obtained by performing multi-phase full-spectrum fitting on the XRD pattern without standard sample quantitative phase analysis, in which Cr 2 The mass percentage of AlC phase is 86.62%, and additionally contains 6.31 mass percentage of Al 8 Cr 5 Miscellaneous phase and 7.07% mass percent Cr 7 C 3 Miscellaneous phase, ie Cr 2 The purity of...
Embodiment 3
[0036] In this embodiment, the substrate is the same as that in Embodiment 1. The preparation process of substrate surface coating is basically the same as that in Example 1, except that in step (2), Cr 2 The Al target sputtering current is 2.5A, and the Al target sputtering current is 2A.
[0037] Adopt EDS energy spectrum to measure chromium, aluminum element content in the coating that above-mentioned makes, obtain that Cr / Al ratio is 1.56 in this coating, as figure 1 shown.
[0038] Measure the XRD spectrum of the coating made above, such as figure 2 As shown, the phase composition and the content of each phase of the coating are obtained by performing multi-phase full-spectrum fitting on the XRD pattern without standard sample quantitative phase analysis, in which Cr 2 The mass percentage of AlC phase is 74.11%, and additionally contains 22.31 mass percentage of Al 8 Cr 5 Miscellaneous phase and 3.58 mass percent Cr 7 C 3 Miscellaneous phase, ie Cr 2 The purity o...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 


