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Photocurable composition and photocurable layer formed from the same

A photocurable and composition technology, which is applied in the field of photocurable composition and photocurable film, can solve the problems of fine patterning limitation, composition viscosity increase, etc., and achieve the effect of excellent gas and moisture barrier properties

Active Publication Date: 2018-07-27
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] However, when an alkali-soluble resin is included, the viscosity of the composition increases and there is a limit in achieving the desired fine patterning

Method used

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  • Photocurable composition and photocurable layer formed from the same
  • Photocurable composition and photocurable layer formed from the same
  • Photocurable composition and photocurable layer formed from the same

Examples

Experimental program
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Effect test

experiment example

[0245] The compositions in Tables 1 and 2, or coating films formed from these compositions, and photocured films were evaluated for viscosity, applicability, pencil hardness, and oxygen inhibition by the evaluation methods described later. The evaluation results are shown in Table 3 below.

[0246] (1) Viscosity measurement

[0247] The viscosity of each composition of an Example and a comparative example was measured using the viscometer (DV3T, manufactured by Brookfield Co., Ltd.) (measurement condition: rotation speed 20 rpm / 25 degreeC).

[0248] (2) Coatability evaluation

[0249] Each composition of the Examples and Comparative Examples was spin-coated on a silicon (Si) sheet cut into a size of 50 mm×50 mm to form a coating film so as to have a thickness of 3.0 μm. After spin coating, it was left to stand for 5 minutes, the shape of the coating film was observed, and applicability was evaluated as follows.

[0250]

[0251] ○: The coating film is spread evenly an...

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Abstract

Provided are a photocurable composition and a photocurable layer formed from the same. The photocurable composition comprises a bifunctional or more allyl ether compound, a monofunctional or bifunctional multiring hydrocarbon-containing (meth)acrylate compound, a carboxylic acid-containing monomer and a photoinitiator. A composition and a photocurable layer with low viscosity and improved reactivity, coating properties and hardness can be realized through interaction between an allyl ether compound and a multiring hydrocarbon-containing (meth)acrylate compound.

Description

technical field [0001] The present invention relates to a photocurable composition and a photocurable film formed from the photocurable composition. More specifically, it relates to a photocurable composition containing a photopolymerizable monomer, and a photocurable film formed from the photocurable composition. Background technique [0002] In order to form various photocurable insulating patterns such as photoresists, insulating films, protective films, black matrices, and columnar spacers of display devices, photosensitive compositions are used. After applying the above-mentioned photosensitive composition, a photocured pattern of a predetermined shape can be formed in a desired region through an exposure step and / or a development step. The above-mentioned photosensitive composition needs to have, for example, high sensitivity to ultraviolet light exposure and polymerization reactivity, and the pattern formed from the photosensitive composition needs to have improved h...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/027G03F7/004H01L27/32H01L51/52
CPCG03F7/004G03F7/027H10K59/00H10K50/84G02F1/133G03F7/028C08F2/50C08F216/12C08F220/18C08K5/37C09D4/06
Inventor 赵庸桓金圣彬全吉敏
Owner DONGWOO FINE CHEM CO LTD
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