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104 results about "Polycyclic Hydrocarbons" patented technology

Hydrocarbons consisting of two or more ring structures.

Autoclavable, non-adherent, heat sealable polymer blends for fabricating monolayer and multiple layered films

The present invention provides a polymer blend for fabricating monolayer films or a layer within a multilayer film. The blend has a first component and a second component. The first component is selected from the group of: (1) an ethylene and α-olefin copolymer having a density of less than about 0.915 g/cc, (2) lower alkyl acrylates, (3) lower alkyl substituted alkyl acrylates and (4) ionomers. The first component should be present in an amount from about 99% to about 55% by weight of the blend. The second component in an amount by weight of the blend from 45% to about 1% and consists of one or more polymers of the group: (1) propylene containing polymers, (2) polybutene polymers, (3) polymethylpentene polymers, (4) cyclic olefin containing polymers and (5) bridged polycyclic hydrocarbon containing polymers. When the blend is fabricated into a film it has a modulus of elasticity when measured in accordance with ASTM D882 of less than about 60,000 psi, an internal haze when measured in accordance with ASTM D1003 of less than about 25%, an internal adhesion ranking of greater than about two, a sample creep at 120° C. under 27 psi loading of less than or equal to 150% for a film having a thickness from about 5 mils to about 15 mils, and the film being capable or being heat sealed into a container having seals wherein the seals remain intact when the container is autoclaved at 121° C. for one hour.
Owner:BAXTER INT INC

Containers and peelable seal containers of new non-PVC material

The present invention provides a flowable materials container. The container has a first sidewall and a second sidewall sealed together along a peripheral seam to define a fluid chamber. At least one sidewall is a film having at least one layer of blend of a first component selected from the group of: (1) ethylene and α-olefin copolymers having a density of less than about 0.915 g / cc, (2) ethylene copolymerized with lower alkyl acrylates, (3) ethylene copolymerized with lower alkyl substituted alkyl acrylates and (4) ionomers, the first component being present in an amount from about 99% to about 55% by weight of the blend, a second component in an amount by weight of the blend from about 45% to about 1% and consists of one or more polymers of the group: (1) propylene containing polymers, (2) polybutene polymers, (3) polymethylpentene polymers, (4) cyclic olefin containing polymers and (5) bridged polycyclic hydrocarbon containing polymers; and the film has a modulus of elasticity when measured in accordance with ASTM D882 of less than about 60,000 psi, an internal haze when measured in accordance with ASTM D1003 of less than about 25%, an internal adhesion ranking of greater than about 2, a sample creep at 120° C. under 27 psi loading of less than or equal to 150% for a film having a thickness of from about 5 mils to about 15 mils, and the film can be heat sealed into a container having seals wherein the seals remain intact when the container is autoclaved at 121° C. for one hour.
Owner:BAXTER INT INC

Positive resist composition and method for forming resist pattern

InactiveUS20070105038A1High resolutionHigh level of sensitivity and resolutionPhotosensitive materialsRadiation applicationsCooking & bakingVitrification
A positive resist composition that includes a base resin component (A) and an acid generator component (B), wherein the component (A) is a copolymer that includes structural units (a-1), which are derived from an (α-lower alkyl) acrylate ester that contains an acid dissociable, dissolution inhibiting group, and also contains an aliphatic cyclic group, structural units (a-2), which are derived from an (α-lower alkyl) acrylate ester that contains a γ-butyrolactone residue, and structural units (a-3), which are derived from an (α-lower alkyl) acrylate ester that contains a hydroxyl group-containing aliphatic polycyclic hydrocarbon group, and the glass transition temperature (Tg) of the copolymer is within a range from 100 to 170° C.; together with a method for forming a resist pattern using a lithography process that includes the steps of applying a chemically amplified positive resist composition to a substrate to provide a resist film, conducting selective exposure of the resist film, performing post exposure baking (PEB), and then conducting alkali developing, wherein the PEB temperature in the lithography process is set to a temperature within ±2° C. of the PEB temperature at which the line and space pattern formed by this lithography process reaches a maximum.
Owner:TOKYO OHKA KOGYO CO LTD
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