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Photocurable composition and photocurable film formed from the photocurable composition

A photocurable and composition technology, which is applied in the field of photocurable film and photocurable composition, can solve the problems of fine patterning limitation, composition viscosity increase, etc., achieve excellent gas and moisture barrier properties, increase density and hardness , to ensure the effect of the degree of polymerization

Active Publication Date: 2021-10-26
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] However, when an alkali-soluble resin is included, the viscosity of the composition increases and there is a limit in achieving the desired fine patterning

Method used

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  • Photocurable composition and photocurable film formed from the photocurable composition
  • Photocurable composition and photocurable film formed from the photocurable composition
  • Photocurable composition and photocurable film formed from the photocurable composition

Examples

Experimental program
Comparison scheme
Effect test

experiment example

[0245] The compositions in Tables 1 and 2, or coating films formed from these compositions, and photocured films were evaluated for viscosity, applicability, pencil hardness, and oxygen inhibition by the evaluation methods described later. The evaluation results are shown in Table 3 below.

[0246] (1) Viscosity measurement

[0247] The viscosity of each composition of an Example and a comparative example was measured using the viscometer (DV3T, manufactured by Brookfield Co., Ltd.) (measurement condition: rotation speed 20 rpm / 25 degreeC).

[0248] (2) Coatability evaluation

[0249] Each composition of the Examples and Comparative Examples was spin-coated on a silicon (Si) sheet cut into a size of 50 mm×50 mm to form a coating film so as to have a thickness of 3.0 μm. After spin coating, it was left to stand for 5 minutes, the shape of the coating film was observed, and applicability was evaluated as follows.

[0250]

[0251] ○: The coating film is spread evenly an...

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Abstract

The present invention provides a photocurable composition containing a bifunctional or higher allyl ether compound, a monofunctional or bifunctional polycyclic hydrocarbon-containing compound, and a photocurable film formed from the photocurable composition. (Meth)acrylate compounds, carboxylic acid-containing monomers and photoinitiators. By the interaction of the allyl ether compound and the polycyclic hydrocarbon-containing (meth)acrylate compound, a composition and a photocurable film having low viscosity, improved reactivity, applicability, and hardness can be realized.

Description

technical field [0001] The present invention relates to a photocurable composition and a photocurable film formed from the photocurable composition. More specifically, it relates to a photocurable composition containing a photopolymerizable monomer, and a photocurable film formed from the photocurable composition. Background technique [0002] In order to form various photocurable insulating patterns such as photoresists, insulating films, protective films, black matrices, and columnar spacers of display devices, photosensitive compositions are used. After applying the above-mentioned photosensitive composition, a photocured pattern of a predetermined shape can be formed in a desired region through an exposure step and / or a development step. The above-mentioned photosensitive composition needs to have, for example, high sensitivity to ultraviolet light exposure and polymerization reactivity, and the pattern formed from the photosensitive composition needs to have improved h...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/027G03F7/004H01L27/32H01L51/52
CPCG03F7/004G03F7/027H10K59/00H10K50/84G02F1/133G03F7/028C08F2/50C08F216/12C08F220/18C08K5/37C09D4/06
Inventor 赵庸桓金圣彬全吉敏
Owner DONGWOO FINE CHEM CO LTD
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