Coating film, manufacturing method therefor, and PVD apparatus
A manufacturing method and coating technology, which can be used in chemical instruments and methods, sputtering plating, ion implantation plating, etc., can solve the problems of inability to be used as a sliding member coating, low hardness, poor wear resistance, etc.
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no. 1 Embodiment approach
[0162] 1. Substrate
[0163] In the present invention, the base material for forming the hard carbon film as the coating film is not particularly limited, and non-ferrous metals or ceramics, hard composite materials, and the like can be used in addition to iron. Specifically, carbon steel, alloy steel, quenched steel, high-speed tool steel, cast iron, aluminum alloy, Mg alloy or superhard alloy, etc., if the film formation temperature of the hard carbon film is considered, it is preferably at A substrate whose properties do not deteriorate significantly at temperatures exceeding 200°C.
[0164] 2. Middle layer
[0165] When forming a hard carbon film, it is preferable to provide an intermediate layer on a substrate in advance. Thereby, the adhesion between the base material and the hard carbon film can be improved, and when the hard carbon film is worn, the exposed intermediate layer can function as wear resistance.
[0166] As such an intermediate layer, a layer using at l...
Embodiment 1
[0249] In Example 1, the use includes image 3 In the arc PVD apparatus of the film-forming furnace 11 shown in (a), hard carbon with a total film thickness of 4.7 μm is deposited on the surface of the substrate 21 by the same method as that of the coating film manufacturing method of the above-mentioned embodiment. Film into film.
[0250] Specifically, after placing the substrate with the CrN layer on the rotation and revolving jig 14 which is also the substrate support device, it is placed in the furnace 11 of the arc type PVD device, and a metal Cr layer with a thickness of 0.2 μm is coated as an intermediate layer. , and then start the hard carbon film formation using a graphite cathode.
[0251] At this time, the base material 21 was rotated and revolved at a rotation speed of 39 rpm and a revolution of 4 rpm. In addition, regarding the temperature conditions during film formation, arc discharge was performed at a bias voltage of -700V and an arc current of 40A for 10 ...
Embodiment 2~ Embodiment 21
[0272] From the results of Experiment 1, it was confirmed that when a black hard carbon layer and a white hard carbon layer are laminated to form a coating film, wear resistance, chip resistance, low friction, Peeling resistance and durability (lifetime) are good, so in the following experiment 2, in the same manner as in Example 1, in the structure in which the black layer and the white layer are alternately laminated, the outermost layer is the white layer, and the total For the hard carbon layer with a film thickness of 4.8 μm to 5.8 μm, various film formation conditions were changed, and the sp of the black hard carbon layer was adjusted to 2 / sp 3 Than, sp of the white hard carbon layer 2 / sp 3 The thickness of the black hard carbon layer and the thickness of the white hard carbon layer were different, and the coating films of Examples 2 to 21 as shown in Table 2 were formed.
[0273] [Table 2]
[0274]
[0275] 2. Evaluation
[0276] The coating films of Examples...
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