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Preparation method of copper sulfide nano-sheet array

A nanosheet array and copper sulfide technology, applied in the field of preparation of nanosheet arrays, can solve the problems of time-consuming, complex preparation process, energy consumption, etc., and achieve the effects of low cost, simple preparation method and few raw materials

Inactive Publication Date: 2018-08-10
HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Although this preparation method can obtain copper sulfide nanosheet arrays, there are also shortcomings. First, the product is copper sulfide nanosheet arrays attached to the surface of nickel foam, which limits its application occasions; secondly, the preparation process involves There are many raw materials, such as hydrochloric acid, copper chloride, ethanol, sulfur powder, etc., and the hydrochloric acid in it is easy to pollute the environment; again, the preparation process is relatively complicated, not only energy-consuming, but also time-consuming

Method used

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  • Preparation method of copper sulfide nano-sheet array

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] The concrete steps of preparation are:

[0027] Step 1, the substrate is first cleaned with ethanol and deionized water. A copper film with a thickness of 20nm is vapor-deposited on the surface of the substrate; wherein, the substrate is a silicon wafer substrate, and the vapor-deposition is magnetron sputtering to obtain a substrate covered with a copper film on the surface.

[0028] In step 2, the substrate covered with the copper film is soaked in 0.001wt% sodium sulfide aqueous solution for 6 hours. Use deionized water (or distilled water) to rinse 2 times after taking it out again, make such as figure 1 The copper sulfide nanosheet array shown in panel a.

Embodiment 2

[0030] The concrete steps of preparation are:

[0031] Step 1, the substrate is first cleaned with ethanol and deionized water. A copper film with a thickness of 140nm was vapor-deposited on the surface of the substrate; wherein, the substrate was a silicon wafer substrate, and the vapor-deposition was magnetron sputtering to obtain a substrate covered with a copper film.

[0032] In step 2, the substrate covered with the copper film is soaked in 0.005wt% sodium sulfide aqueous solution for 5.5 hours. After taking it out, rinse it twice with deionized water (or distilled water) to obtain a product similar to figure 1 The copper sulfide nanosheet array shown in panel a.

Embodiment 3

[0034] The concrete steps of preparation are:

[0035] Step 1, the substrate is first cleaned with ethanol and deionized water. A copper film with a thickness of 260nm is vapor-deposited on the surface of the substrate; wherein, the substrate is a silicon wafer substrate, and the vapor-deposition is magnetron sputtering to obtain a substrate covered with a copper film on the surface.

[0036] In step 2, the substrate covered with the copper film is soaked in 0.01wt% sodium sulfide aqueous solution for 5 hours. Use deionized water (or distilled water) to rinse 3 times after taking it out again, make such as figure 1 The copper sulfide nanosheet array shown in panel b.

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Abstract

The invention discloses a preparation method of a copper sulfide nano-sheet array. The preparation method comprises a solution method and especially comprises the following specific steps: evaporatinga copper film with the thickness of 20 to 500nm on the surface of a substrate, so as to obtain a substrate with the surface coated with the copper film; then putting the substrate with the surface coated with the copper film into a sodium sulfide water solution with the concentration of 0.001 to 0.1 weight percent and immersing for at least 4h; then taking out the substrate and washing to preparea target product with the sheet length of 100 to 2000nm and the sheet thickness of 10 to 50nm. According to the preparation method disclosed by the invention, the copper sulfide nano-sheet array cangrow on various substrates, and the preparation method has the characteristics of few raw materials, greenness and environment protection, energy saving and time saving and low cost, so that the target product is extremely easily widely and commercially applied to the fields of solar cells, photocatalysis and sensors.

Description

technical field [0001] The invention relates to a preparation method of a nanosheet array, in particular to a preparation method of a copper sulfide nanosheet array. Background technique [0002] Due to its stable physical and chemical properties and excellent photoelectric properties, as well as its wide application in solar cells, photocatalysis, and sensing, nano-copper sulfide has attracted widespread attention. At present, the methods for preparing nano-copper sulfide mainly include hydrothermal method and pyrolysis method, such as a preparation method for generating rough CuS nanosheet arrays on the surface of nickel foam published in Chinese invention patent application CN 106057478A on October 26, 2016 and its application. The preparation method described in the patent application documents for this invention is to pretreat the nickel foam first, and then form a single layer of copper on the surface of the nickel foam, and then use a hydrothermal method to form a ro...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01G3/12C03C17/22C04B41/65C04B41/85
CPCC01G3/12C01P2004/20C01P2004/61C01P2004/62C01P2004/64C03C17/22C04B41/5014C04B41/65C04B41/85C04B41/4558
Inventor 王兆明吴兵朱晓光许伟肖志远
Owner HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI
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