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40 results about "Gallium sulfide" patented technology

Gallium sulfide may refer to: Gallium sulfide, Ga₂S₃ Gallium sulfide, GaS

Method for preparing flexible optical detector on basis of two-dimensional functional material

The invention discloses a method for preparing a flexible optical detector on the basis of the two-dimensional functional material, which relates to a preparation method for the optical detector. The method mainly aims to solve the technical problems that the conventional flexible optical detector has high photolithographic process technology cost and has difficulty in realizing mass production. The method comprises the following steps of: 1) preparing semiconductor materials, i.e. single crystal gallium selenide or single crystal gallium sulfide; 2) sticking and stripping on the surface of the semiconductor material by a scotch adhesive tape; 3) transferring the two-dimensional semiconductor material to a substrate; 4) covering a copper mask to the substrate processed in the step 3), depositing a gold metal layer and a chrome layer, removing the mask, and carrying out annealing processing; and 5) screening electrode couples with photoelectronic response to ultraviolet light in an optical detector semiconductor obtained in the step 4) to obtain the flexible optical detector prepared on the basis of the two-dimensional functional material. The ultraviolet light response degree of the optical detector is above 100AW<-1>. The flexible optical detector can be used as a microelectronic device and a photosensitive device to be used for the field of information transmission and storage.
Owner:HARBIN INST OF TECH

Method for preparing copper gallium sulfide photoelectric thin film from copper chloride

The invention provides a method for preparing a copper gallium sulfide photoelectric thin film from copper chloride, and belongs to the technical field of preparation of photoelectric thin films for solar cells. The copper gallium sulfide photoelectric thin film is obtained through the following steps of: firstly, cleaning a glass substrate and then putting CuCl2.2H2O, Ga(NO3)3.xH2O and CH3CSNH2 into a solvent for mixing evenly; obtaining a precursor thin film on a glass sheet through a spin-coating method, drying the precursor thin film and putting the precursor thin film into a closed container with hydrazine hydrate; preventing a precursor thin film sample from being in contact with the hydrazine hydrate and arranging the closed container with the sample into an oven for heating and heat preservation treatment; and finally taking out the sample to soak for 24 hours and then drying the sample to obtain the copper gallium sulfide photoelectric thin film. A high-temperature and high-vacuum condition is not needed; the method is low in demands on instruments and equipment, low in production cost, high in production efficiency and easy to operate; the obtained copper gallium sulfide photoelectric thin film has relatively good continuity and uniformity; the main phase is a CuGaS2 phase; by the novel technology, the component and the structure of a target product are easy to control; and a low-cost production method capable of achieving industrialization is provided for preparation of the high-performance copper gallium sulfide photoelectric thin film.
Owner:SHANDONG JIANZHU UNIV

Method for preparing copper gallium sulfide photoelectric thin film from copper sulfate

The invention provides a method for preparing a copper gallium sulfide photoelectric thin film from copper sulfate, and belongs to the technical field of preparation of photoelectric thin films for solar cells. The copper gallium sulfide photoelectric thin film is obtained through the following steps of: firstly, cleaning a glass substrate and then putting Cu2SO4.5H2O, Ga(NO3)3.xH2O and CH3CSNH2 into a solvent for mixing evenly; obtaining a precursor thin film on a glass sheet through a spin-coating method, drying the precursor thin film and putting the precursor thin film into a closed container with hydrazine hydrate; preventing a precursor thin film sample from being in contact with the hydrazine hydrate and arranging the closed container with the sample into an oven for heating and heat preservation treatment; and finally taking out the sample to soak for 24 hours and then drying the sample to obtain the copper gallium sulfide photoelectric thin film. A high-temperature and high-vacuum condition is not needed; the method is low in demands on instruments and equipment, low in production cost, high in production efficiency and easy to operate; the obtained copper gallium sulfide photoelectric thin film has relatively good continuity and uniformity; the main phase is a CuGaS2 phase; by the novel technology, the component and the structure of a target product are easy to control; and a low-cost production method capable of achieving industrialization is provided for preparation of the high-performance copper gallium sulfide photoelectric thin film.
Owner:SHANDONG JIANZHU UNIV

A light-emitting diode epitaxial structure based on aluminum gallium nitride material and its manufacturing method

The invention relates to an epitaxial structure of a light emitting diode based on aluminum gallium nitride material and a manufacturing method thereof. The invention optimizes the light extraction structure for an ultraviolet light emitting diode based on tunneling effect. The UV light emitting diode using the n-p-n-type tunneling structure can effectively avoid the absorption of UV light by the traditional p-type gallium nitride in the pn structure of the UV diode, that is, the use of n-type aluminum gallium nitride (its aluminum Composition high enough that its band bandwidth is substantially transparent to UV light from the active layer) and a very thin layer of n-type or undoped gallium nitride (5 nm and below), and a layer of p-type nitrogen A carrier injection structure based on the tunneling effect of aluminum gallium sulfide (the aluminum composition of which is high enough that its energy band bandwidth is substantially transparent to ultraviolet light from the active layer). The ultraviolet light emitting diode with this structure needs to be combined with a new light extraction structure and technology to effectively extract the ultraviolet light absorbed in the traditional ultraviolet light emitting diode from the p surface.
Owner:XUZHOU LIYU ADVANCED TECH CO LTD
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