Transparent conductive film with single layer structure, preparation method and application thereof
A technology of transparent conductive film and single-layer structure, which is applied in the direction of conductive layer, coating, and metal material coating process on the insulating carrier to achieve the effects of improving moisture and heat stability, improving anti-surge characteristics, and improving thermal stability
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[0031] Example 1
[0032] (1)Using ultra-white glass with a thickness of 1mm as a transparent substrate, ultrasonically cleaning the glass with acetone, ethanol, and deionized water, and using dry N 2 Blow dry, then immediately put it into the vacuum chamber of the vacuum magnetron sputtering equipment, and start vacuuming;
[0033] (2) The vacuum of the vacuum chamber is to be pumped to 7×10 -4 Below Pa, introduce 40 sccm high purity argon as the deposition gas, and control the total pressure to 0.16 Pa. Take Ag-CdO alloy as the target material, where the atomic percentage of CdO is 12.9%; adjust the sputtering power of the target material to 40W, and use DC magnetron sputtering method to continue sputtering for 15s to deposit on the surface of the substrate, and film deposition After the end, the sample is taken out to obtain a glass / Ag-CdO sample, that is, the transparent conductive film. During the preparation process, the substrate temperature is room temperature, keep the su...
Example Embodiment
[0035] Example 2
[0036] (1)Using ultra-white glass with a thickness of 1mm as a transparent substrate, ultrasonically cleaning the glass with acetone, ethanol, and deionized water, and using dry N 2 Blow dry, then immediately put it into the vacuum chamber of the vacuum magnetron sputtering equipment, and start vacuuming;
[0037] (2) The vacuum of the vacuum chamber is to be pumped to 7×10 -4 Below Pa, introduce 40 sccm high purity argon as the deposition gas, and control the total pressure to 0.16 Pa. Using co-sputtering, using pure Ag and conductive ZnO as targets, adjust the sputtering power of the pure Ag target to 40W, and the conductive ZnO target to 16W. The DC magnetron sputtering method is used for continuous sputtering for 18s. The surface of the substrate is deposited, and the sample is taken out after the film deposition is completed, and a glass / Ag-ZnO sample is obtained. In the obtained sample, the atomic percentage of ZnO is 2.3%.
[0038] (3) The thickness of the...
Example Embodiment
[0039] Example 3
[0040] (1)Using ultra-white glass with a thickness of 1mm as a transparent substrate, ultrasonically cleaning the glass with acetone, ethanol, and deionized water, and using dry N 2 Blow dry, then immediately put it into the vacuum chamber of the vacuum magnetron sputtering equipment, and start vacuuming;
[0041] (2) The vacuum of the vacuum chamber is to be pumped to 7×10 -4 Below Pa, introduce 40 sccm high purity argon as the deposition gas, and control the total pressure to 0.16 Pa. Take Ag-CdO alloy as the target material, where the atomic percentage of CdO is 3.6%; adjust the sputtering power of the target material to 40W, and use the DC magnetron sputtering method to continue sputtering for 1 min to deposit on the surface of the substrate and film deposition After the end, the sample is taken out to obtain a glass / Ag-CdO sample, that is, the transparent conductive film. During the preparation process, the substrate temperature is room temperature, keep t...
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