Film thickness and refractive index simultaneous measurement device and measurement method

A technology of film thickness and measurement method, which is applied in the field of optical measurement, can solve problems such as the inability to eliminate laser transmitted light, the destruction of film surface morphology, and the difficulty of demodulation

Active Publication Date: 2018-08-21
HARBIN ENG UNIV
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  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] In 2013, Ma Xizhi and others from Nanjing University of Aeronautics and Astronautics disclosed an ultrasonic film thickness measuring instrument and its measurement method (Chinese patent application number: 201310198294.9). Measure the correlation characteristics of the reflected pulse to measure the thickness of the oil film; however, this method is only suitable for the measurement of the liquid mode, and different models need to be established for films with different thickness ranges, and the demodulation is difficult
In 2014, Jia Chuanwu of Shandong University and others disclosed a system for measuring film thickness by wide-spectrum optical interferometry (Chinese patent application number: 201410290494.1). Interferometer, the thickness of the film to be tested can be obtained by measuring the length of the Fabry Perot cavity before and after placing the film to be tested under the mirror. This method has a simple structure and high measurement accuracy. Under the mirror, it is easy to damage the morphology of the film surface
[0007] In 2017, t

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  • Film thickness and refractive index simultaneous measurement device and measurement method
  • Film thickness and refractive index simultaneous measurement device and measurement method

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Embodiment 1

[0054] The overall technical scheme of the present invention is as figure 1 shown. The wide-spectrum light output module 1 is composed of a wide-spectrum light source 101 with a center wavelength of 1310nm and a first isolator 102 with an operating wavelength of 1310nm. The wide-spectrum light source 101 is used as a measurement light source and is mainly used to achieve absolute measurement of film thickness; The wide laser output module is composed of a narrow linewidth laser light source 201 with a wavelength of 1550nm and a second isolator 202 with an operating wavelength of 1550nm. The narrow linewidth frequency-stabilized laser light source 103 is used as the optical path correction light source, mainly used to realize the traceability of film thickness measurement . The light emitted by the wide-spectrum light source 101 enters the beam-splitting coupler 2 with a splitting ratio of 3dB through the first isolator 102, and is divided into two paths, passing through the ...

Embodiment 2

[0060] A device for simultaneous measurement of film thickness and refractive index consists of five parts: a wide-spectrum light output module 1, a narrow linewidth laser output module 2, a film thickness measurement probe module 3, a demodulation interferometer module 4, and an acquisition and control module 5. ;

[0061]The output light of the wide-spectrum light output module 1 is divided into two paths through the first beam splitter coupler 6 and enters the first measuring probe 301 and the second measuring probe 301 of the film thickness measuring probe module 3 through the first circulator 10 and the second circulator 13 respectively. In the measuring probe 302; the return light via the first measuring probe 301 and the second measuring probe 302 enters the first wavelength division multiplexer 8 and the second wavelength division multiplexer respectively through the first circulator 10 and the second circulator 11 9 relevant wavelength input terminals;

[0062] The o...

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Abstract

The invention discloses a film thickness and refractive index simultaneous measurement device and measurement method and belongs to the optical measurement field. The measurement device specifically includes a wide-spectrum light source output module, a narrow-linewidth laser light source output module, a film thickness measurement probe module, a demodulation interferometer module, and an acquisition and control module. According to the film thickness and refractive index simultaneous measurement device and measurement method of the invention, the output signals of the narrow-linewidth laserlight source output module are directly inputted into the demodulation interferometer module, and therefore, interference signals can share the same optical path, and at the same time, the influence of the transmitted light of laser and the multiple-reflected light of the laser in the film thickness measuring probe module on the quality of the interference signals can be avoided; and the length ofthe pigtails of a film thickness measuring probe can be controlled, so that the interference of the transmitted light of wide-spectrum light in the film thickness measurement probe module on characteristic signal peak identification can be avoided. With the film thickness and refractive index simultaneous measurement device and measurement method of the invention adopted, the non-contact measurement of the thickness and refractive index of a film can be realized with the calibration of a calibration sample not required. The film thickness and refractive index simultaneous measurement device and measurement method have the advantages of self-calibration, traceability of measurement results, high stability, simplicity in characteristic signal identification and the like.

Description

technical field [0001] The design of the invention belongs to the field of optical measurement, and in particular relates to a device and a measurement method for simultaneously measuring film thickness and refractive index. Background technique [0002] With the vigorous development of material science and technology, in order to meet the urgent needs of microelectronics, optoelectronics, new energy and other fields, thin films are widely used in optical engineering, mechanical engineering, communication engineering, biological engineering, aerospace engineering, chemical engineering, medical engineering and other fields. is widely used. The thickness of the film is not only one of the key parameters in film production, but also determines the application performance of the film in mechanical, electromagnetic, optoelectronic and optical scenarios. Accurate measurement of film thickness has always been one of the most important links in film production and application. [...

Claims

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Application Information

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IPC IPC(8): G01B11/06G01N21/45
CPCG01B11/06G01N21/45G01N2021/4126
Inventor 杨军卢旭苑勇贵李寒阳马驰祝海波张建中苑立波
Owner HARBIN ENG UNIV
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