Surface-treated copper foil and copper-clad laminate produced using same
A technology of surface treatment and copper foil, which is applied in the direction of printed circuit manufacturing, application, coating, etc., can solve the problems of reduced transmission loss characteristics, insufficient required characteristics, etc., and achieve the effect of excellent dielectric properties
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Embodiment 1
[0100] Under the following conditions, the surface-treated copper foil was fabricated into an unroughened (surface roughness Rz about 0.8 μm) copper foil substrate with a thickness of 18 μm.
[0101] (1) Formation of roughened layer
[0102] The roughening treatment on the surface of the copper foil base was performed in the following order: roughening plating treatment 1 was performed under the conditions in Table 1, and then roughening plating treatment 2 shown below was performed to form a roughened layer.
[0103]
[0104] (rough surface plating treatment 2)
[0105] Copper sulfate: 13 to 72g / L in terms of copper concentration
[0106] Sulfuric acid concentration: 26 to 133g / L
[0107] Liquid temperature: 18 to 67°C
[0108] Current density: 3 to 67A / dm 2
[0109] Processing time: 1 second to 1 minute 55 seconds
[0110] (2) Formation of base layer containing Ni
[0111] After forming a roughened layer on the surface of the copper foil substrate, electroplating i...
Embodiment 2 to Embodiment 18
[0143] The surface roughening plating process 1 was performed based on the content of Table 1, and the silane coupling agent process was performed based on the content of Table 2, and it processed similarly to Example 1 except having performed it.
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