Organic solar battery based on ultrasonic annealing process and preparation method thereof
A technology of solar cells and annealing process, which is applied in the direction of circuits, photovoltaic power generation, electrical components, etc., can solve the problems of reducing the energy conversion efficiency of devices and weak light absorption of the photoactive layer, so as to improve the energy conversion efficiency and the active layer The effect of smooth, high charge separation efficiency
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0042] like Figure 1-3 As shown, make the control device A:
[0043] The device structure is: ITO, ZnO(30nm), P3HT:(tbt)2Ir(acac):PC71BM(100nm), MoO3(15nm), Ag(100nm);
[0044] The specific preparation is as follows:
[0045] Step 1: Clean the ITO glass substrate layer 1:
[0046] Step 1.1: Set the parameters of the ultrasonic instrument: temperature 30°C, time 15min, power 70w;
[0047] Step 1.2: Wipe the surface of the ITO glass substrate layer 1 with a dust-free cloth dipped in acetone until no particles are observed with the naked eye;
[0048] Step 1.3: Place the scrubbed ITO glass substrate layer 1 on a polytetrafluoroethylene substrate holder, and then put it into a beaker of deionized water with detergent for the first step of ultrasonic cleaning;
[0049] Step 1.4: Take out the substrate holder, rinse it with acetone and put it into a beaker filled with acetone for the second step of cleaning;
[0050]Step 1.5: The third step of ultrasonic cleaning the ITO glass...
Embodiment 2
[0061] like Figure 1-3 As shown, make device B:
[0062] The device structure is: ITO, ZnO (30nm), P3HT: (tbt) 2 Ir(acac):PC 71 BM (100nm), MoO 3 (15nm), Ag(100nm);
[0063] The preparation process is:
[0064] Step 1: Clean the ITO glass substrate layer 1:
[0065] Step 1.1: Set the parameters of the ultrasonic instrument: temperature 30°C, time 15min, power 70w;
[0066] Step 1.2: Wipe the surface of the ITO glass substrate layer 1 with a dust-free cloth dipped in acetone until no particles are observed with the naked eye;
[0067] Step 1.3: Place the scrubbed ITO glass substrate layer 1 on a polytetrafluoroethylene substrate holder, and then put it into a beaker of deionized water with detergent for the first step of ultrasonic cleaning;
[0068] Step 1.4: Take out the substrate holder, rinse it with acetone and put it into a beaker filled with acetone for the second step of cleaning;
[0069] Step 1.5 carries out the third step ultrasonic cleaning to the ITO glass...
PUM
| Property | Measurement | Unit |
|---|---|---|
| Open circuit voltage | aaaaa | aaaaa |
| Short circuit current | aaaaa | aaaaa |
| Short circuit current | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 


