Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method and device for preparing high-silicon silicon steel thin strip under low-intensity magnetic field

A low-strength, high-silicon technology, applied in electrolytic coatings, coatings, etc., can solve the problems of inability to provide sufficient silicon sources for low-silicon substrates, limitations, poor uniformity of silicon distribution, etc., to achieve stable and controllable production processes and original structure. The effect of small impact and avoiding processing difficulties

Inactive Publication Date: 2018-11-13
GUIZHOU INST OF TECH
View PDF16 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the use of these processes is complex, high energy consumption, and poor uniformity in the distribution of silicon elements, which limit its application
When the electrodeposition-diffusion preparation method is used, electroplating is carried out under conventional conditions, and the silicon content of the obtained coating is small, which cannot provide sufficient silicon sources for the low-silicon substrate. Applying a magnetic field can significantly increase the silicon content of the coating, but the surface of the coating is very rough, and The strength of the applied magnetic field is relatively high. Regardless of the electroplating under conventional conditions or under a magnetic field, the hydrogen evolution reaction in the electroplating process is relatively serious when using an aqueous electroplating solution, and the bonding strength between the obtained coating and the substrate is low, which limits the further application of the process; therefore, the development Cheap and efficient high-silicon silicon steel preparation method is still a key problem to be solved urgently

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method and device for preparing high-silicon silicon steel thin strip under low-intensity magnetic field

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0039] 1) Preparation of modified silicon-iron particles: The pure silicon powder with a particle size range of 0-10 μm is first added to the ferrous solution in a reducing environment for electroless reduction, so that the surface of the silicon particles is coated with a layer of pure Iron layer, to obtain modified silicon-iron particles, compared with pure silicon particles, the magnetic susceptibility and conductivity of the particles are significantly improved. Then it is filtered and dried in a vacuum environment for later use.

[0040] 2) Preparation of iron reduction solution: Add PAA polymer surfactant and deionized water with a concentration of 20wt% to deionized water in a ratio of 1:4 to 10, and add wetting agent (sodium dodecyl sulfamate) 0.2g / L, dispersant (hexadecyltrimethylammonium bromide) 5g / L, catalyst activator (palladium chloride) 2g / L, add silicon particles 100-500g / L, stir vigorously in water bath for 60min , then add 10-50g / L NaBH4 reducing agent, add ...

Embodiment 2

[0046] see figure 1 , the device for preparing high-silicon steel strips under a low-intensity magnetic field is applied to the above method, including a constant magnetic field generator 1, a protection device 2, an electroplating tank 3, an electroplating tank cover plate 4, a polytetrafluoroethylene bottom 5, and an electroplating solution 6 , modified silicon-iron particles 7, pure iron sheet anode 8, low silicon steel strip cathode 9, pulse power supply 10, mechanical stirring paddle 11, mechanical stirring control device 12, grid baffle 14 with mesh 13, etc. The temperature-resistant electroplating tank 3 is placed on the polytetrafluoroethylene base plate 5, and the periphery is successively the electroplating tank 3, the protective material 2 and the constant magnetic field generator 1 from the inside to the outside; the electroplating tank 3 contains the electroplating solution 6 And modified silicon-iron particles 7, the inner bottom is provided with a mechanical sti...

Embodiment 3

[0048] A method for preparing high-silicon silicon steel strips under a low-intensity magnetic field. The specific operation process of this embodiment is as follows:

[0049] Filling the electroplating solution 6 with a peak particle size of 2 μm and plating a 0.1-0.5um iron layer on the surface of the silicon particles to obtain modified silicon-iron particles 7 is placed in a temperature-resistant electroplating tank 3 with a capacity of 50 L. The ingredients are: alcohol as solvent, 0.5mol / L Na2SO4, 0.90mol / L FeSO4, 0.15mol / L FeCl2, 0.43mol / LNH4Cl, adding 20g / L modified silicon-iron particles 7. The electroplating tank 3 is provided with a pure iron sheet anode 8 and a thin strip cathode 9 of low-silicon silicon steel with a silicon content of 3wt% Si. At the same time, in order to ensure that the modified silicon-iron particles 7 in the electroplating solution 6 are evenly distributed, a mechanical stirring paddle 11 and a mechanical stirring control device 12 are used to...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
particle sizeaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a method for utilizing a static magnetic field pulse composite electroplating technology for obtaining a high-silicon clad layer on the surface of a low-silicon steel sheet andthen obtaining a high-silicon silicon steel thin strip with the silicon content being 6.5 wt% of Si through the heat treatment technology. According to the method, operation is simple, the silicon increasing operation can be achieved at the normal temperature, cost is low, and the near-net-shape high-silicon silicon steel strip can be prepared.

Description

technical field [0001] The invention relates to a method and a device for preparing high-silicon silicon steel strips under a magnetic field. The invention belongs to the technical field of soft magnetic material preparation and electroplating. Background technique [0002] As a very important energy conversion material, silicon steel thin strip is widely used in electric power, electrical appliances, electronics and national defense and military industries. Silicon steel is currently the soft magnetic material with the largest output and consumption in the fields of electricity and magnetism. As the silicon content increases, the soft magnetic properties of the silicon steel strip increase. When the silicon content in the silicon steel increases to 6.5wt%, the magnetic properties of the silicon steel reach the best. At this time, the magnetostriction coefficient of the silicon steel strip is almost reduced to zero. . However, as the silicon content increases, the brittlen...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C25D5/18C25D15/00C25D5/50C25D7/06
CPCC25D5/006C25D5/18C25D5/50C25D7/0614C25D15/00
Inventor 龙琼路坊海张英哲
Owner GUIZHOU INST OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com