Active nanoscale monocrystalline silicon dioxide is characterized in that a processing course of the monocrystalline silicon dioxide is as follows: 1) course screening, wherein the environment is water-based, the PH value of washing, pickling and neutralizing treatment is controlled to be 4-10, impurities on the surfaces of ores are removed, and monocrystal is crushed; 2) dry crushing, wherein thelinear speed is 6 m/s-25 m/s, and air pressure is 2-18 kilograms; 3) monocrystal classifying process and dry type classifying monocrystal lapping process; 4) wet-method crushing, wherein the environment is neutral and water-based, dispersing treatment and nanoscale grinding are carried out under the condition that the morphology of the monocrystal is not damaged, particles are subjected to finalfineness processing, thus, the particles can reach nanoscale of 10-800 nanometers, the specific surface area is maximum to achieve an effect of easiness in dispersion, the nanoscale particles are formed and processed, the final particle appearances are treated and polished, the surface activity of the particles is high, and combined forming of rubber is facilitated; and 5) nano surface processing,nano active treatment and processing of liquid into powder.