A kind of cultivation method of radish sprouts with high yield and high phenolic substance content

A technology of material content and cultivation method, which is applied in the field of cultivation of radish sprouts with high yield and high phenolic substance content, can solve the problems of unsatisfactory yield and quality, thin stems and leaves of sprouts, etc., and achieve the promotion of absorption and utilization efficiency, leaves The effect of fattening and enhancing the enzyme activity of seed cells

Inactive Publication Date: 2020-08-18
界首市鑫康家庭农场
View PDF11 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Radish sprouts contain a lot of substances that are beneficial to human health, such as vitamin C, glucosinolates, and phenolic substances. They are very popular in China and Southeast Asian countries, but most of the commercially available sprouts have thin stems and leaves. Not ideal; in addition, phenolic substances, as important secondary metabolites in plants, have multiple biological activities, such as anti-oxidation, anti-tumor, anti-virus and antibacterial, and are one of the nutritional and health-care qualities of sprouts; so the invention A method for increasing the content and output of phenolic substances in radish sprouts can effectively improve the nutritional and health quality of radish sprouts, increase the economic benefits of sprout planting, bring breakthroughs to the sprout planting industry, and promote Further Development of the Sprouts Industry

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0017] In an embodiment of the present invention, a method for cultivating radish sprouts with high yield and high phenolic substance content, the specific method is as follows:

[0018] (1) Use radish seeds with full grains 60 Radiation treatment with Co-γ rays, immersed in magnesium chloride solution for 60 minutes and stirring continuously, drained, rinsed with water for 3 to 4 times, immersed in glucose nutrient solution at a temperature of 47 to 49 ° C for 75 minutes, drained The liquid is taken out, and the radish seeds have to be processed;

[0019] (2) Sow the treated radish seeds in the seedling substrate, the sowing depth is 1.1~1.3cm;

[0020] The seedling-raising substrate is made of the following raw materials in parts by weight: 10 parts of sunflower seed shells, 13 parts of pear dregs, 55 parts of leaf humus, 0.07 parts of hyodeoxycholic acid, 0.12 parts of chelerythrine, perilla polysaccharide 0.14 parts, large thistle polysaccharide 0.12 parts.

[0021] As ...

Embodiment 2

[0027] In an embodiment of the present invention, a method for cultivating radish sprouts with high yield and high phenolic substance content, the specific method is as follows:

[0028] (1) Use radish seeds with full grains 60 Co-γ rays were irradiated, immersed in magnesium chloride solution for 65 minutes and stirred continuously, drained, rinsed with water for 3 to 4 times, immersed in glucose nutrient solution at a temperature of 47 to 49°C for 80 minutes, drained The liquid is taken out, and the radish seeds have to be processed;

[0029] (2) Sow the treated radish seeds in the seedling substrate, the sowing depth is 1.1~1.3cm;

[0030] The seedling-raising substrate is made of the following raw materials in parts by weight: 11 parts of sunflower seed shells, 14 parts of pear dregs, 55-60 parts of leaf humus, 0.075 parts of hyodeoxycholic acid, 0.125 parts of chelerythrine, purple 0.145 parts of Su polysaccharide, 0.125 parts of Daji polysaccharide.

[0031] As a furt...

Embodiment 3

[0037] In an embodiment of the present invention, a method for cultivating radish sprouts with high yield and high phenolic substance content, the specific method is as follows:

[0038] (1) Use radish seeds with full grains 60Radiation treatment with Co-γ rays, immersed in magnesium chloride solution for 70 minutes and stirring continuously, drained, rinsed with water for 3 to 4 times, immersed in glucose nutrient solution at a temperature of 49°C for 85 minutes, drained and removed out, the radish seeds have to be processed;

[0039] (2) Sow the treated radish seeds in the seedling substrate, the sowing depth is 1.1~1.3cm;

[0040] The seedling-raising matrix is ​​made of the following raw materials in parts by weight: 12 parts of sunflower seed shells, 15 parts of pear dregs, 60 parts of leaf humus, 0.08 parts of hyodeoxycholic acid, 0.13 parts of chelerythrine, perilla polysaccharide 0.15 parts, 0.12~0.13 parts of thistle polysaccharide.

[0041] As a further solution o...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
quality scoreaaaaaaaaaa
Login to view more

Abstract

The invention belongs to the technical field of radish sprouting cultivation and particularly provides a cultivation method of a high-yield radish sprouting having high phenolic substance content. Thecultivation method comprises the following specific steps that 1, irradiation treatment is conducted on radish seeds by using 60 Co-gama rays, the radish seeds are immersed in a magnesium chloride solution for soaking, constant stirring is performed, draining is performed, the seeds are taken out and are flushed with clear water for 3-4 times, the seeds are immersed in a warm glucose nutrient solution for heat preserved soaking, draining is performed, the seeds are taken out, and treated radish seeds are obtained; 2, the treated radish seeds are sowed in a seedling raising medium, the sowingdepth is 1.1-1.3 cm, and the obtained seedling raising medium is prepared from the following raw materials: sunflower seed shells, pear residue, leaf mold, hyodeoxycholic acid, chelerythrine, perillapolysaccharide and thistle polysaccharide. Vigorous growth of stems and leaves of radish sprouts can be effectively promoted, the bitter taste of the radish sprouts can be reduced, the content of total phenols can be increased, the fresh weight of upper-portion parts can be increased, high-yield and high-quality radish sprouts are produced, human health is effectively promoted, and the economic benefits of radish sprouts are increased.

Description

technical field [0001] The invention belongs to the technical field of radish sprouts cultivation, in particular to a method for cultivating radish sprouts with high yield and high phenolic substance content. Background technique [0002] Radish sprouts contain a lot of substances that are beneficial to human health, such as vitamin C, glucosinolates, phenolic substances, etc., and are very popular in China and Southeast Asian countries. However, most of the commercially available sprouts have thin stems and leaves, and the yield and quality Not ideal; in addition, phenolic substances, as important secondary metabolites in plants, have multiple biological activities, such as anti-oxidation, anti-tumor, anti-virus and anti-bacterial, and are one of the nutritional and health-care qualities of sprouts; so the invention A method for increasing the content and output of phenolic substances in radish sprouts can effectively improve the nutritional and health quality of radish spr...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): A01C1/00A01G24/22A01G24/27A01G24/28A01G24/20A01G22/15A01G22/25C05G1/00C05G3/00
CPCA01C1/00A01G22/25A01G24/22A01G24/25C05D5/00C05F5/002C05F11/00C05G3/00C05G5/20
Inventor 郭俊强
Owner 界首市鑫康家庭农场
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap