A high-sensitivity torsional pendulum silicon micro-accelerometer and its preparation method

A high-sensitivity, accelerometer technology, applied in the direction of velocity/acceleration/shock measurement, measurement of acceleration, instruments, etc., can solve the problem of small effective detection area of ​​sensitive mass, limitations of temperature characteristics and robustness, low device space utilization, etc. problems, to achieve the effect of increasing the effective detection area, improving space utilization, and high processing quality

Active Publication Date: 2021-02-26
NAT UNIV OF DEFENSE TECH +1
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, low sensitivity, high noise, temperature characteristics and robustness are limited by its own structure
[0004] Chinese patent documents with patent application numbers 201410825011.3 and 201410606833.2 disclose two types of torsion micro-mechanical accelerometers, but the sensitive masses for micro-acceleration in the above two prior art are connected to the support beam through the cantilever beam, and the anchor points are placed outside The fixing method of the silicon sensitive structure has the problems of low device space utilization, small effective detection area of ​​the sensitive mass block, and low sensitivity; and both solutions are prepared by wet etching process, which has the problems of large device area, low yield and processing cost advanced questions

Method used

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  • A high-sensitivity torsional pendulum silicon micro-accelerometer and its preparation method
  • A high-sensitivity torsional pendulum silicon micro-accelerometer and its preparation method
  • A high-sensitivity torsional pendulum silicon micro-accelerometer and its preparation method

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preparation example Construction

[0062] Such as Image 6 As shown, the implementation steps of the preparation method of the high-sensitivity torsion-type silicon micro-accelerometer of the present embodiment include:

[0063] 1) Prepare the first SOI silicon wafer for preparing the silicon substrate 1, such as Image 6 As shown in (a), the device layer thickness of the first SOI silicon chip in this embodiment is 6 microns;

[0064] 2) On the surface of the first SOI silicon wafer, form the capacitance gap between the silicon sensitive structure 2 and the silicon substrate 1 by dry etching the first depth (2 microns), such as Image 6 as shown in (b);

[0065] 3) On the surface of the first piece of SOI silicon wafer, form the capacitor plate assembly 11 and the lead electrode assembly 12 by dry etching the second depth (4 microns), such as Image 6 as shown in (c);

[0066] 4) epitaxially grow a layer of 0.5 micron thick silicon dioxide on the surface of the first SOI silicon wafer, such as Image 6 as...

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Abstract

The invention discloses a high-sensitivity torsion-type silicon micro-accelerometer and a preparation method thereof. The silicon micro-accelerometer includes a silicon substrate and a silicon sensitive structure connected as one. The silicon sensitive structure includes a stress release structure, two pairs of support beams, a pair of Coupling sensitive masses and a pair of anchor points, a pair of coupled sensitive masses are symmetrically arranged, and each coupled sensitive mass is connected to the anchor point through a separate support beam, and connected through another separate support beam It is connected and coupled with the stress release structure, and the centroid of each coupled sensitive mass is located at the midpoint of the support beam connected with the anchor point; the preparation method is prepared by dry etching. The invention has the advantages of high device space utilization rate, large effective detection area of ​​sensitive mass blocks, high sensitivity, high yield, low cost, high processing quality, good processing robustness and wide application range.

Description

technical field [0001] The invention relates to silicon microsensor technology, in particular to a high-sensitivity torsion-type silicon micro-accelerometer and a preparation method thereof. Background technique [0002] Accelerometers are mainly used to measure the motion parameters of moving objects relative to inertial space, and are indispensable sensor devices for modern life. Compared with traditional accelerometers, MEMS micro-accelerometers have the characteristics of small size, low power consumption, and easy batch processing, so they quickly become a research hotspot at home and abroad, and their performance is constantly improving, and they are widely used in military and civilian fields. [0003] At present, foreign uniaxial micro-accelerometer products have matured and been widely used. Domestic research and development of uniaxial micro-accelerometers are also increasing, and some laboratories have developed high-performance engineering. However, how to manuf...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01P15/125
CPCG01P15/125
Inventor 肖定邦吴学忠侯占强陈志华苗桐侨卓明周剑张勇猛朱新建李涛李青松胡倩
Owner NAT UNIV OF DEFENSE TECH
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