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Sand blasting process suitable for plasma spraying

A plasma and sandblasting technology, which is applied in metal material coating process, coating, melt spraying, etc., can solve the problems of non-reusable use, a large number of dust particles, and polluting the etching environment, so as to prolong the service life and spray High sand efficiency and good sandblasting quality

Inactive Publication Date: 2018-12-21
芜湖通潮精密机械股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

While etching the product, the dry etching environment also etches the structural parts and functional parts of the cavity. In frequent use, it is easy to produce peeling and a large number of dust particles, which will pollute the etching environment and cause product damage. There are many bad etchings, and such parts cannot be reused

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] A sandblasting method for increasing the surface roughness of a metal part substrate, comprising the steps of:

[0024] (1) Check the base parts of the workpiece before sand blasting to confirm the surface condition of the product base and the parts to be sand blasted; open the compressed air valve to check whether the air pressure is normal; check the sand blasting system, whether the number of sand meshes is accurate, and whether the amount of sand is sufficient Use, whether the sand out of the cavity is normal. If everything is normal, proceed to the next step.

[0025] (2) Carry out simple cleaning on the alloy sheet parts, dipping in 0.2% lye for 15s to remove surface oil stains, perform secondary pressure cleaning with pure water, and then blow dry with nitrogen air gun; for the upper and lower electrodes, use surface- The side-back-surface high-pressure pure water cleaning method, the cleaned electrode is blown dry with a nitrogen air gun, and dried at 55°C for ...

Embodiment 2

[0028] A sandblasting method for increasing the surface roughness of a ceramic component substrate, comprising the steps of:

[0029] (1) Check the base parts of the workpiece before sand blasting to confirm the surface condition of the product base and the parts to be sand blasted; open the compressed air valve to check whether the air pressure is normal; check the sand blasting system, whether the number of sand meshes is accurate, and whether the amount of sand is sufficient Use, whether the sand out of the cavity is normal. If everything is normal, proceed to the next step.

[0030] (2) Simple cleaning of ceramic thin plate parts, immersion in 0.2% lye for 15s to remove surface oil stains, second pressurization cleaning with pure water, followed by drying with a nitrogen air gun, and drying at 55°C for 24 hours.

[0031] (3) Wrap the non-spraying surface of the workpiece with a special tape for spraying, fix the workpiece, and then sandblast the substrate of the workpiece...

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Abstract

The invention discloses a sand blasting process suitable for plasma spraying. The process comprises the following steps of firstly, a workpiece base body is subjected to cleaning, impurity removal anddrying; secondly, the non-spraying face of the workpiece is subjected to coating and shielding treatment; and thirdly, the spraying face of the fixed workpiece base body is subjected to sand blasting, the sand blasting pressure ranges from 0.2 to 0.4 Mpa, and the sand blasting height ranges from 20 cm to 100 cm. Through the sand blasting process, the surface roughness of the workpiece base body is improved, a clean combination interface is provided, the subsequent coating quality is improved, the strength, hardness, corrosion resistance and wear resistance of the base body are improved, and the service life is prolonged.

Description

technical field [0001] The invention belongs to the technical field of surface treatment, and in particular relates to a sandblasting process suitable for plasma spraying. Background technique [0002] In the production process of liquid crystal panels or semiconductor products, glass substrates and chips are usually etched through a dry etching process to produce corresponding graphics. While etching the product, the dry etching environment also etches the structural parts and functional parts of the cavity. In frequent use, it is easy to produce peeling and a large number of dust particles, which will pollute the etching environment and cause product damage. There are many bad etchings, and such parts cannot be reused. Therefore, it is necessary to make an anti-corrosion film on the surface of the cavity and components, and provide an excellent etching environment and increase the service life of the cavity by regularly updating the film. [0003] Before spraying the ant...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C4/02C23C4/134B24C1/10
CPCB24C1/10C23C4/02C23C4/134
Inventor 黄艳芳司奇峰王慧赵浩
Owner 芜湖通潮精密机械股份有限公司
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