Ultra-hard W-Cr-Al-Ti-N nano gradient multilayer film material and preparation method thereof

An al-ti-si, multi-layer film technology, applied in the field of metal surface coating, can solve the problems of low hardness, poor coating toughness, weak film-base bonding force, etc., to improve the hardness and improve the film-base bonding force. Effect

Active Publication Date: 2018-12-28
YANTAI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the coatings or multilayer films in the above-mentioned prior art still have problems such as low hardness, weak bonding force of the film base, poor coating toughness, etc., and further improvement is still needed in the above aspects

Method used

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  • Ultra-hard W-Cr-Al-Ti-N nano gradient multilayer film material and preparation method thereof
  • Ultra-hard W-Cr-Al-Ti-N nano gradient multilayer film material and preparation method thereof
  • Ultra-hard W-Cr-Al-Ti-N nano gradient multilayer film material and preparation method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0035] A preparation method of a superhard W-Cr-Al-Ti-N nanometer gradient multilayer film material, which comprises the following steps:

[0036] (1) Sample treatment: After rough grinding, fine grinding, rough polishing, and fine polishing of the metal matrix sample on metallographic sandpaper, it was cleaned ultrasonically in acetone for 10 minutes, and then ultrasonically cleaned twice with ethanol. Take out and dry;

[0037] (2) Equipment preparation: a multi-arc ion coating machine is used, and the target materials are 3 W simple substance targets with a purity of 99.99%, 3 Cr simple substance targets with a purity of 99.99%, 1 Al-Ti alloy target and 1 Al-Ti-Si alloy target, the working gas is Ar gas with a purity of 99.99%. After loading the sample treated in step (1) into the furnace, adjust the rotation speed of the sample holder to 3rpm, heat the temperature of the deposition chamber to 450°C, and pump Vacuum to ≤4×10 -3 After Pa, pass Ar gas and carry out ion bomb...

Embodiment 2

[0045] A preparation method of a superhard W-Cr-Al-Ti-N nanometer gradient multilayer film material, which comprises the following steps:

[0046] (1) Sample treatment: After rough grinding, fine grinding, rough polishing, and fine polishing of the metal matrix sample on metallographic sandpaper, it was cleaned ultrasonically in acetone for 10 minutes, and then ultrasonically cleaned twice with ethanol. Take out and dry;

[0047] (2) Equipment preparation: a multi-arc ion coating machine is used, and the target materials are 3 W simple substance targets with a purity of 99.99%, 3 Cr simple substance targets with a purity of 99.99%, 1 Al-Ti alloy target and 1 Al-Ti-Si alloy target, the working gas is Ar gas with a purity of 99.99%. After loading the sample treated in step (1) into the furnace, adjust the rotation speed of the sample holder to 3rpm, heat the temperature of the deposition chamber to 450°C, and pump Vacuum to ≤4×10 -3 After Pa, pass Ar gas and carry out ion bomb...

Embodiment 3

[0054] A preparation method of a superhard W-Cr-Al-Ti-N nanometer gradient multilayer film material, which comprises the following steps:

[0055] (1) Sample treatment: After rough grinding, fine grinding, rough polishing, and fine polishing of the metal matrix sample on metallographic sandpaper, it was cleaned ultrasonically in acetone for 10 minutes, and then ultrasonically cleaned twice with ethanol. Take out and dry;

[0056] (2) Equipment preparation: a multi-arc ion coating machine is used, and the target materials are 3 W simple substance targets with a purity of 99.99%, 3 Cr simple substance targets with a purity of 99.99%, 1 Al-Ti alloy target and 1 Al-Ti-Si alloy target, the working gas is Ar gas with a purity of 99.99%. After loading the sample treated in step (1) into the furnace, adjust the rotation speed of the sample holder to 3rpm, heat the temperature of the deposition chamber to 450°C, and pump Vacuum to ≤4×10 -3 After Pa, pass Ar gas and carry out ion bomb...

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Abstract

The invention provides an ultra-hard W-Cr-Al-Ti-N nano gradient multilayer film material and a preparation method thereof. Multi-arc ion plating technology is adopted in the preparation method, a tungsten element is introduced into a multilayer film, and NH3 and N2 are adopted as reaction gases together to prepare the nano gradient multilayer film material, so that the bonding force between film layers is strengthened, and the hardness of the film layers is greatly improved.

Description

technical field [0001] The invention belongs to the technical field of metal surface coatings, and in particular relates to a W-Cr-Al-Ti-N nanometer gradient multilayer film material. Background technique [0002] Vapor deposition technology is an important method for preparing coatings, mainly including CVD (chemical vapor deposition) and PVD (physical vapor deposition), which is the most active research field in contemporary vacuum technology and material science, and is also the mainstream of tool surface coating technology at present. direction, it can not only be used to prepare thin film coatings with various special properties, but also can be used to prepare various functional thin film materials and decorative thin film coatings and to deposit various compounds, nonmetals, semiconductors, ceramics, plastics film etc. Compared with CVD technology, PVD technology has the advantages of deposition temperature; fast deposition rate; the deposited coating has a fine stru...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/32C23C14/06C23C14/02
CPCC23C14/0021C23C14/025C23C14/0641C23C14/325C23C28/36
Inventor 李杨张尚洲叶倩文朱宜杰刘晓梅陈永明邵钲杰
Owner YANTAI UNIV
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