Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Copper recovery and regeneration system for acidic copper(II) chloride etchant and recovery and regeneration method

A regeneration system and etching solution technology, which is applied in the direction of photographic process, instrument, photographic auxiliary process, etc., can solve the problems of large consumption of chemical agents, waste of chemical raw materials, and complicated equipment, so as to improve the efficiency of copper recovery, save production costs, The effect of high degree of automation

Active Publication Date: 2019-01-08
安徽绿洲危险废物综合利用有限公司
View PDF4 Cites 11 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the copper recovered from the waste liquid by these treatment methods is in the form of compounds, the product value is low, and a large amount of chemical agents are consumed in the treatment process
In addition, due to the technical limitations of each chemical recovery method itself, a considerable part of copper has not been recovered, but is discharged into the environment, causing environmental pollution
[0004] At present, there are many domestic and foreign companies researching and developing copper chloride etching solution to recover copper by electrolysis. The equipment developed by them has different problems in the process of use, which makes it unable to be put into industrial use. For example, the etching solution cannot be recycled after electrolytic copper extraction. , not only pollute the environment, but also lead to waste of chemical raw materials; another technical problem is that chlorine gas will be precipitated at the anode during the electrolysis process. According to theoretical calculations, for every 100kg of copper electrolytically deposited, 111.6kg of chlorine gas will be precipitated at the anode. , its volume in standard state is about 35.26m 3 , how to properly dispose of a large amount of chlorine gas and residual waste liquid without causing secondary pollution to the environment will undoubtedly increase the cost and complicate the equipment

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Copper recovery and regeneration system for acidic copper(II) chloride etchant and recovery and regeneration method
  • Copper recovery and regeneration system for acidic copper(II) chloride etchant and recovery and regeneration method
  • Copper recovery and regeneration system for acidic copper(II) chloride etchant and recovery and regeneration method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0045] The acidic copper chloride etching solution copper recovery and regeneration system in this embodiment includes an etching solution regeneration system and a waste gas treatment system located downstream of the etching solution regeneration system, and also includes a molten iron washing solution treatment system. The etching solution regeneration system includes an etching production line connected in sequence, a waste Liquid storage barrel, electrolytic cell, regeneration liquid storage barrel, the downstream of the regeneration liquid storage barrel is connected to the etching production line, the anode area of ​​the electrolytic cell is connected to the dissolution absorption cylinder, the jet device, and the etching production line are connected in sequence;

[0046] The molten iron washing liquid treatment system includes a molten iron tank, a molten iron absorption tank, and a molten iron washing tower connected in sequence;

[0047] The etching production line ha...

Embodiment 2

[0053] The acidic copper chloride etching solution copper recovery and regeneration system in this embodiment includes an etching solution regeneration system and a waste gas treatment system located downstream of the etching solution regeneration system, and also includes a molten iron washing solution treatment system. The etching solution regeneration system includes an etching production line connected in sequence, a waste Liquid storage barrel, electrolytic cell, regeneration liquid storage barrel, the downstream of the regeneration liquid storage barrel is connected to the etching production line, the anode area of ​​the electrolytic cell is connected to the dissolution absorption cylinder, the jet device, and the etching production line are connected in sequence;

[0054] The molten iron washing liquid treatment system includes a molten iron tank, a molten iron absorption tank, and a molten iron washing tower connected in sequence;

[0055] The etching production line ha...

Embodiment 3

[0062] The acidic copper chloride etching solution copper recovery and regeneration system in this embodiment includes an etching solution regeneration system and a waste gas treatment system located downstream of the etching solution regeneration system, and also includes a molten iron washing solution treatment system. The etching solution regeneration system includes an etching production line connected in sequence, a waste Liquid storage barrel, electrolytic cell, regeneration liquid storage barrel, the downstream of the regeneration liquid storage barrel is connected to the etching production line, the anode area of ​​the electrolytic cell is connected to the dissolution absorption cylinder, the jet device, and the etching production line are connected in sequence;

[0063] The molten iron washing liquid treatment system includes a molten iron tank, a molten iron absorption tank, and a molten iron washing tower connected in sequence;

[0064] The etching production line ha...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a copper recovery and regeneration system for an acidic copper(II) chloride etchant and a recovery and regeneration method, and relates to the technical field of cyclic regeneration of etchants. The copper recovery and regeneration system for the acidic copper(II) chloride etchant comprises an etchant regeneration system, a waste gas treatment system located in a downstreamposition of the etchant regeneration system as well as a liquid iron cleaning solution treatment system. With the adoption of the copper recovery and regeneration method for the acidic copper(II) chloride etchant, the problems that the conventional recovery and regeneration for the acidic copper(II) chloride etchant is high in energy consumption and low in reuse rate and contains many cathode copper impurities, and secondary pollution to the environment is caused by chlorine are solved effectively, and technical support is provided for comprehensive application of an electrolytic regenerationcycle technique for the acidic copper(II) chloride etchant.

Description

technical field [0001] The invention relates to the technical field of recycling and regeneration of etching solution, in particular to a copper recovery and regeneration system and a recovery and regeneration method of acidic copper chloride etching solution. Background technique [0002] Printed circuit boards are the basic components of various electronic products. An important part of the production process is to use chemical etching to etch away the excess copper (generally 60-70%) beyond the needs of the circuit on the copper foil board. Acidic copper chloride etchant and alkaline copper chloride etchant are currently the most used etchant, among which acidic copper chloride etchant is especially suitable for printed circuit board products with high etching precision requirements due to its characteristics of small side etching, and is used by a large number of Printed circuit board factories are increasingly used. The chemical reaction that occurs during the etching ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C23F1/46C23F1/08C25C1/12C25C7/00C25C7/08
CPCC23F1/08C23F1/46C25C1/12C25C7/00C25C7/08Y02P10/20
Inventor 袁胜巧
Owner 安徽绿洲危险废物综合利用有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products