A photosensitive coating film composition and application thereof
A technology for covering films and compositions, applied in the directions of optics, optomechanical equipment, photosensitive materials for optomechanical equipment, etc., can solve the problems of heat resistance and chemical resistance limitations, uneconomical, and uneven film, etc. Achieve the effect of improving high temperature resistance, improving adhesion and weakening phase separation
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[0020] The invention is further elucidated below.
[0021] The resin binder involved in a photosensitive developable cover film composition described in the present invention comprises two parts. One part is an epoxy resin adhesive containing the above general structural formula (I), which consists of five basic structural units. The first unit is 10-40 wt% glycidyl (meth)acrylate, which is introduced into the epoxy structure. The second and third units are alkyl acrylate and alkyl methacrylate respectively. The alkyl group contains 1-7 carbons, accounting for 25-60wt%, mainly to adjust the overall flexibility of the epoxy resin , including but not limited to methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, isopropyl (meth)acrylate, butyl (meth)acrylate, (meth) Isobutyl acrylate, hexyl (meth)acrylate, heptyl (meth)acrylate, etc. The fourth unit 2-8wt% component contains alkyl (meth)acrylates with carbon numbers of 8-15, which can be exemplified but not li...
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