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Non-alkali aluminium silicate glass as well as preparation method and application thereof

A technology of silicate glass and alkali aluminum, which is applied in the field of glass manufacturing, can solve the problems of unsatisfactory homogenization effect of display substrate glass, thermal stability, low thermal shrinkage rate, high elastic modulus, etc., and achieve low thermal shrinkage rate, good thermal Stability, Effect of High Elastic Modulus

Active Publication Date: 2019-01-18
DONGXU OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] The purpose of the present invention is to provide an alkali-free aluminosilicate glass, its preparation method and application, the alkali-free aluminosilicate glass has lower density and higher modulus of elasticity, good thermal stability and lower thermal shrinkage rate, and the alkali-free aluminosilicate glass is at 308nm and / or High transmittance at 550nm

Method used

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  • Non-alkali aluminium silicate glass as well as preparation method and application thereof
  • Non-alkali aluminium silicate glass as well as preparation method and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1-8

[0104] Weigh the components as shown in Table 1, mix well, and pour the mixture into a high zirconium brick crucible (ZrO 2 >85wt%), then heated in a resistance furnace at 1630°C for 24 hours, and stirred slowly and uniformly with a platinum-rhodium alloy (80wt%Pt+20wt%Rh) stirrer. The molten glass is poured into a stainless steel mold to form a specified block glass product, and then the glass product is annealed in an annealing furnace for 2 hours, and the power is turned off and the furnace is cooled to 25°C. The glass product is cut, ground and polished, then cleaned with deionized water and dried to obtain a glass product with a thickness of 0.5 mm. Various properties of each glass finished product were measured, and the results are shown in Table 1.

Embodiment 9-15

[0106] According to the method of Example 1, the difference is that the composition of the mixture (corresponding to the glass composition) and the performance measurement results of the obtained product are shown in Table 2.

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PUM

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Abstract

The invention relates to the field of glass manufacturing, and discloses non-alkali aluminium silicate glass as well as a preparation method and application thereof. When the non-alkali aluminium silicate glass is at a temperature of 1600 DEG C, electrical resistivity of glass melt is lower than or equal to 200 Ohm.cm; when viscosity of the non-alkali aluminium silicate glass is 35000 poises, thecorresponding temperature T35000 is greater than or equal to 1250 DEG C; when the viscosity of the non-alkali aluminium silicate glass is 1013 poises, the corresponding annealing point is greater thanor equal to 790 DEG C. The non-alkali aluminium silicate glass provided by the invention has relatively low density and relatively high elastic modulus, good thermal stability and a relatively low thermal shrinkage rate; and the non-alkali aluminium silicate glass has a high penetration rate at 308 nm and / or 550 nm, and is suitable for large industrial production.

Description

technical field [0001] The invention relates to the field of glass manufacturing, in particular to alkali-free aluminosilicate glass and a preparation method and application thereof. Background technique [0002] With the rapid development of the optoelectronic industry, the demand for various display devices is increasing, such as active matrix liquid crystal display (AMLCD), organic light emitting diode (OLED), and active matrix liquid crystal display (LTPS TFT- LCD) devices, these display devices are based on the use of thin-film semiconductor materials to produce thin-film transistor (TFT) technology. The mainstream silicon-based TFT can be divided into amorphous silicon (a-Si) TFT, polycrystalline silicon (p-Si) TFT and single crystal silicon (SCS) TFT, of which amorphous silicon (a-Si) TFT is the current mainstream TFT-LCD. The applied technology, amorphous silicon (a-Si) TFT technology, can be processed at a temperature of 300-450°C in the production process. LTPS p...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C3/112C03C3/118
CPCC03C3/112C03C3/118C03C3/095Y02P40/57
Inventor 张广涛王俊峰李刚韩文梅李志勇闫冬成王丽红
Owner DONGXU OPTOELECTRONICS TECH CO LTD
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