A method for manufacturing an electromagnetic shielding optical window by using electric field driven jet 3D printing

Abstract

A method for manufacturing an electromagnetic shielding optical window by using electric field-driven jet 3D printing includes as the following steps pretreating hard transparent substrate to reduce surface energy, using a single potential-based electric field to drive the spray deposition 3D printing process and equipment, using a glass needle as a nozzle, using a particle-free nano silver pasteas a printing material, and performing a metal grid structure array on the surface of the pretreated substrate according to a set path print, printing a first layer of metal grid on the substrate, printing the other layers by the self-focusing effect of the electric field driven jet 3D printing until the metal grid structure array is completed; baking or sintering the substrate of the metal grid,and performing sintering according to the set temperature and time, and allowing the non-particle nano silver paste to be converted and reduced into conductive nano silver by post-sintering treatment,completing the conductive treatment, and forming a metal grid structure electromagnetic shielding optical window.

Description

technical field [0001] The invention relates to a method for manufacturing an electromagnetic shielding optical window by using electric field-driven jetting 3D printing. Background technique [0002] Optical windows of aerospace equipment, anti-electromagnetic leakage light windows of military confidential facilities, observation windows of medical electromagnetic isolation rooms, optical windows of precision optoelectronic instruments, transparent electromagnetic shielding components of communication equipment, mobile phone touch screens, etc. Windows put forward higher and higher requirements. For example, in order to realize the observation and detection of air and ground targets, the aircraft usually installs one or more precision photoelectric imaging and detection instruments in the instrument cabin or working cabin, working in a wide band from visible light to far infrared. In order to achieve specific observation and detection functions, the aircraft must reserve a...

AI Technical Summary

Problems solved by technology

[0008] At present, there are many manufacturing methods based on the metal grid structure electromagnetic shielding optical window metal grid, such as optical lithography, nanoimprinting, inkjet printing, aerosol printing, electrohydrodynamic jet printing and other manufacturing technologies, but these technology or solution currently has certain limitations

(1) Optical lithography: Traditional photolithography is a commonly used method for preparing metal grid transparent electrodes, which can realize large-scale large-scale preparation and mature technology, but it requires very high flatness of the substrate, which is difficult To achieve large-area manufacturing, the manufacturing cost is very high; (2) nanoimprinting method can achieve ultra-high resolution (minimum to 200nm) and can achieve a large aspect ratio, but nanoimprinting faces severe challenges in large-scale manufacturing Challenges. In large-area manufacturing, the large contact area between the template and the imprinted pattern will cause problems such as difficult peeling and deformation of the imprinted pattern. At the same time, the preparation of high-precision templates usually requires electron beam etching or focused ion beam etching. Time-consuming and expensive; (3) Inkjet printing (whether it is thermal bubble or piezoelectric) is currently facing the problem of low resolution (line width greater than 20 μm), which cannot meet the needs of transparent electrodes in many fields such as touch screens and OLEDs. Requirements, and the viscosity of the printing material is limited (the viscosity is usually limited to below 30cP), and it is impossible to realize the printing of nano-silver paste with high viscosity and high silver content; Ratio of 5μm) and printing material viscosity (less than 1000cP) have been greatly improved, and can realize large aspect ratio structure (such as line width of 20-50μm, thickness of 8-10μm), but the existing accuracy is still It cannot meet the requirements of high-resolution metal grid transparent electrodes, and the equipment cost is very high, and the printing materials are limited; (5) Although electrohydrodynamic jet printing has very high precision, it requires a pair of electrodes (for patterned substrates). There are very high requirements on the conductivity and flatness of the material, the stability of high-resolution printing on insulating substrates is poor, and it is difficult to realize patterning on insulating substrates such as glass), to achieve high-resolution (ultra-fine) patterns, The printing capability of large aspect ratio structures is insufficient, especially it is difficult to achieve conformal printing, and the stability of the printing process is poor

Therefore, it is still difficult for these existing technologies to realize efficient and low-cost manufacturing of ultra-fine line width and large aspect ratio metal grid structure, especially to realize large-area ultra-fine line width and large Fabrication of high-aspect-ratio metal grid structures faces greater challenges

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