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High-reliability CVD graphene transparent infrared emission film and preparation method thereof

A technology of infrared emission and graphene, applied in the field of far infrared, can solve problems such as loss, vulnerability, and reduced infrared emission effect, and achieve the effects of increasing surface roughness, improving reliability, improving force and adhesion

Active Publication Date: 2019-03-26
CHONGQING GRAPHENE TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] In order to solve the problem that CVD graphene is easily damaged in the prior art, resulting in reduced or even complete loss of the infrared emission effect, the present invention provides a high-reliability transparent infrared emission film based on a single-layer CVD graphene film, which can withstand 1 Thousands of times of repeated bending (bending radius is 5mm) to maintain the integrity of the infrared emission function

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  • High-reliability CVD graphene transparent infrared emission film and preparation method thereof
  • High-reliability CVD graphene transparent infrared emission film and preparation method thereof
  • High-reliability CVD graphene transparent infrared emission film and preparation method thereof

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Embodiment 1

[0036] see figure 1 , is a structural schematic diagram of an embodiment of a high-reliability CVD graphene transparent infrared emitting film of the present invention. Specifically, a high-reliability CVD graphene transparent infrared emitting film in this embodiment includes a transparent substrate 011, an adhesion enhancement layer 012, a graphene layer 013 and an electrode layer 014 that are sequentially stacked from bottom to top, wherein the The adhesion enhancing layer 012 is in direct contact with the graphene layer 013 .

[0037] In this embodiment, the adhesion enhancing layer 12 is made of a polymer rich in polar organic functional groups, specifically, the polar organic functional groups include any one of hydroxyl, carboxyl, mercapto and sulfonic acid groups, or Both hydroxyl and mercapto groups are included, and the polymer is a non-crosslinked linear or branched structure, or a chemically crosslinked structure.

[0038] Further, the hardness of the polymer is...

Embodiment 2

[0041]The present invention also provides a kind of preparation method of high-reliability CVD graphene transparent infrared emitting film, and it is by using hydroxyethyl methacrylate, hydroxyethyl acrylate (HEA), methacrylic acid (MA), acrylic acid (AA) Any one or more than one monomer in the polypropylene glycol ether main chain containing double bond photoactive resin and photoinitiator are stirred and dissolved to obtain a transparent photocurable precursor solution, and then the transparent photocurable precursor solution is sprayed on On the single-layer CVD graphene film prepared by CVD method in advance, the single-layer CVD graphene film coated with transparent photocurable precursor solution is rolled and bonded on the transparent substrate, and the precursor solution is made Solidify to form the adhesion enhancement layer between the transparent substrate and the single-layer CVD graphene layer; then lay the electrode layer on the single-layer CVD graphene layer, th...

Embodiment 3

[0059] The present invention also provides another preparation method of high-reliability CVD graphene transparent infrared emission film, which will be described in detail below in conjunction with specific embodiments and accompanying drawings:

[0060] The preparation method of the infrared emitting film of the present embodiment comprises:

[0061] Step 1, on the copper foil substrate, use the CVD method to prepare a single-layer CVD graphene layer, and roll the heat-peeling tape to the single-layer CVD graphene layer, and then use solution etching to remove the copper foil and leak out the graphene Layer and rinse and dry.

[0062] In step 2, PVA is dissolved in deionized water to prepare an aqueous solution, and the PVA aqueous solution is coated on the target substrate PEN through dimples, and then heated and dried to form a PVA-based linear adhesion enhancement layer.

[0063] In this embodiment, the thickness of the PVA layer is in the range of 0.1-30 um. Of course, ...

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Abstract

The invention discloses a high-reliability CVD graphene transparent infrared emission film and a preparation method thereof. An adhesion enhancement layer having a specific structure is arranged between a graphene layer and a substrate layer. Since the adhesion enhancement layer has a flexible main chain structure and has a lateral group being a highly-polarity group, the adhesion enhancement layer is close to the graphene at a molecular scale; on the basis of the coordinated movement of molecular chains, the polar group of the adhesion enhancement layer and graphene grain boundary defects form a strong hydrogen-bond interaction to the greatest extent and the stress transmitted to the interface is absorbed by the fracture of the hydrogen bond, so that the damage of the single-layer graphene film structure under the external force is avoided. After stress disappearance, the hydrogen bond is formed reversibly and thus a long-lasting-effect interfacial force enhancement effect is provided, thereby guaranteeing the reliability of the infrared emission film.

Description

technical field [0001] The invention relates to the field of far-infrared technology, and relates to a high-reliability CVD graphene transparent infrared emission film and a preparation method thereof. Background technique [0002] In recent years, graphene-based infrared emitting films have attracted much attention due to their advantages of thinness, portability, transparent appearance, small heat capacity and low heat loss. However, there are many structural defects in the grain boundaries of graphene films prepared by CVD (Chemical Vapor Deposition, chemical vapor deposition), which greatly weakens its mechanical properties: the tensile strength and failure strain are only 2GPa and 0.2% respectively (Nat.Commun .2014, 5, 3782). Also because of the low mechanical strength of graphene prepared by CVD, the infrared emission film based on graphene has the following defects: [0003] 1. During the manufacturing process of infrared emission film, graphene prepared by CVD met...

Claims

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Application Information

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IPC IPC(8): H05B3/14H05B3/34C09D7/63C09D125/18C09D129/04C09D133/02C09D171/02
CPCC09D125/18C09D129/04C09D133/02C09D171/02C09D7/63H05B3/145H05B3/34
Inventor 姜浩徐鑫马金鑫王仲勋史浩飞张雪峰
Owner CHONGQING GRAPHENE TECH
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