Electromagnetic wave shielding film and preparation method thereof
A shielding film and electromagnetic wave technology, applied in the field of electronics, can solve the problems affecting the transmittance and conduction performance of the shielding film, and the difficulty of preparing electromagnetic shielding film films, so as to reduce the use of production raw materials, uniform film layer, and simple preparation process Effect
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[0033] Such as figure 1 As shown, the embodiment of the present invention provides a method for preparing an electromagnetic wave shielding film, comprising the following steps:
[0034] S10. Obtain the carrier layer 20, and prepare the protective layer 10 on one surface of the carrier layer 20;
[0035] S20. forming a metal stack 30 by vacuum sputtering on the surface of the carrier layer 20 away from the protective layer 10,
[0036] Wherein, the metal stack 30 includes a first metal protection layer 31 , a metal functional layer 32 and a second metal protection layer 33 sequentially stacked on the surface of the carrier layer away from the protection layer.
[0037] The preparation method of the electromagnetic wave shielding film provided by the embodiment of the present invention is to prepare the protective layer 10 on one side of the carrier layer 20, and then form the metal stack 30 on the other side of the carrier layer 20 by vacuum sputtering. The vacuum sputtering ...
Embodiment 1
[0068] An electromagnetic wave shielding film.
[0069] Using a 5 micron polyethylene naphthalate film as the carrier layer 20;
[0070] A high-precision laminating machine is used to coat a polyethylene terephthalate protective layer 10 with a thickness of 28 microns on the carrier layer 20;
[0071] Then through a high-precision sputtering machine, the vacuum level is 1*10 -3 Pa, under the condition of 50ppm argon gas, sputtering titanium target, silver target and titanium target on the surface of the carrier layer 20 away from the protective layer 10 in sequence, forming the first metal protective layer 31, the metal functional layer 32 and the second metal protective layer in sequence 33. The thickness of the first metal protection layer 31 is 2 nanometers, the thickness of the metal function layer 32 is 5 nanometers, and the thickness of the second metal protection layer 33 is 2 nanometers.
[0072] Obtain an electromagnetic wave shielding film.
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