Alkali-free aluminoborosilicate glass and application thereof

A technology of borosilicate glass and alkali aluminum, applied in the field of alkali-free alumino borosilicate glass and its application, to achieve the effect of facilitating float production, increasing difficulty and cost, and adjusting thermal expansion coefficient

Inactive Publication Date: 2019-04-12
WUHAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, this patent application uses a rare earth oxide Y 2 o 3 , and the viscosity is 200 poise (ie logη = 1.3), in order to ensure less than 1650 ℃

Method used

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  • Alkali-free aluminoborosilicate glass and application thereof
  • Alkali-free aluminoborosilicate glass and application thereof
  • Alkali-free aluminoborosilicate glass and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1-5

[0023] The chemical composition (each component is measured in mole percent) and performance index of the alkali-free aluminoborosilicate glass respectively provided in Examples 1-5 are shown in Table 1, and the alkaline earth metal oxides are MgO and CaO.

[0024] Table 1. Glass compositions with different MgO-CaO ratios

[0025]

[0026]

Embodiment 6-10

[0028] The chemical composition (each component is measured in mole percent) and performance indexes of the alkali-free aluminoborosilicate glass respectively provided in Examples 6-10 are shown in Table 2. The alkaline earth metal oxides are CaO and SrO.

[0029] Table 2. Glass compositions with different CaO-SrO ratios

[0030] Composition (mol%)

Embodiment 11-15

[0032] The chemical composition (each component is measured in mole percent) and performance indexes of the alkali-free aluminoborosilicate glass respectively provided in Examples 11-15 are shown in Table 3, and the alkaline earth metal oxides are MgO and SrO.

[0033] Table 3. Glass compositions with different MgO-SrO ratios

[0034]

[0035]

[0036] As can be seen from Table 1, when MgO+CaO=16mol%, adjusting the MgO / CaO ratio regulates the thermal expansion coefficient of the glass, especially when 0.253 , the strain point is above 650°C, and the corresponding temperature of logη=1 is less than 1630°C.

[0037] It can be seen from Table 2 that when CaO+SrO=16mol%, adjusting the ratio of CaO / SrO regulates the thermal expansion coefficient of the glass, especially when CaO / (CaO+SrO)=0.5, Example 8 can make the thermal expansion coefficient close to the optimal range , the density is less than 2.60g / cm 3 , the strain point is above 650°C, and logη=1 corresponds to a tem...

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Abstract

The invention relates to alkali-free aluminoborosilicate glass. The glass is prepared from, by molar ratio, 61.00-65.00% of SiO2, 11.00-12.00% of Al2O3, 6.00-8.00% of B2O3, (16.00-x)% of R1O, and x% of R2O (X=0-16), wherein R1O and R2O are selected from one of the alkaline earth metal oxides such as MgO, SrO and CaO, and R1O and R2O are different. The optimum ratio of the linear expansion coefficients of alkaline earth metal oxides is 0.25 <MgO/(MgO+CaO)<0.5, CaO/(CaO+SrO)=0.5, and MgO/(MgO+SrO) = 0.5. The alkali-free aluminoborosilicate glass has the advantages of being low in density, high in strain point, suitable for the float production process, and capable of being applied to a thin film transistor liquid crystal displayer.

Description

technical field [0001] The invention relates to an alkali-free aluminoborosilicate glass and its application, belonging to the technical field of glass. technical background [0002] Currently, TFTs can be classified into amorphous silicon (a-Si) TFTs, polycrystalline silicon (p-Si) TFTs, and single crystal silicon (SCS) TFTs. At present, very mature TFT-LCD display devices mainly use amorphous silicon (a-Si) TFT technology, and the processing temperature in the production process can be completed below 600°C. For active matrix OLED (AMOLED), since OLED is a current-driven electronic device, it requires a higher driving current, and the current amorphous silicon (a-Si) technology is mainly suitable for voltage-driven TFT-LCD , and its driving current is low, which cannot meet the requirements of AMOLED for driving current, while LTPS polysilicon (p-Si) TFT has high driving current and electron mobility, which can meet the requirements of AMOLED for driving current. At the ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C3/091
CPCC03C3/091
Inventor 谢俊狄青松韩建军王静刘超
Owner WUHAN UNIV OF TECH
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