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Water-based cleaning agent containing polyhedral oligomeric silsesquioxane and preparation method of water-based cleaning agent

A technology of polysilsesquioxane and water-based cleaning agent, which is applied in the direction of surface-active detergent composition, detergent compounding agent, detergent composition, etc., and can solve the problems affecting device yield, performance and reliability, metal The ionic effect is not ideal, there is no problem such as the application of hydrophilic polyhedral oligomeric silsesquioxane, and the effect of high decontamination rate is achieved

Active Publication Date: 2019-04-26
SHANGHAI YINUO BIOTECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

If the cleaning effect is not good, it will directly affect the yield, performance and reliability of the device
However, the effect of existing cleaning agents on reducing metal ions on the surface of silicon wafers is not ideal
However, there is no report on the application of hydrophilic polyhedral oligosilsesquioxane in cleaning agents

Method used

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  • Water-based cleaning agent containing polyhedral oligomeric silsesquioxane and preparation method of water-based cleaning agent
  • Water-based cleaning agent containing polyhedral oligomeric silsesquioxane and preparation method of water-based cleaning agent

Examples

Experimental program
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Effect test

Embodiment 1

[0055] This example relates to the preparation of a water-based cleaning agent comprising polyhedral oligomeric silsesquioxanes.

[0056] The specific experimental steps of this embodiment are as follows. First, add 740kg of pure water to the 1500L enamel kettle. Then, start stirring, weigh 30kg of APG and add it to the kettle, add 30kg of sodium ethylenediamine tetramethylene phosphonate (EDTMPS), add 100kg of potassium hydroxide, then add 50kg of potassium silicate, 20kg of ethylene glycol butyl ether, defoaming Agent 12kg, peroxybenzoic acid 1kg and octaamino polyhedral oligomeric silsesquioxane 0.5kg. Continue to stir and cool down to 20-25°C, and let stand for 4 hours. Filtration and blowing, the feed liquid has two layers, the upper layer is filled with an iron drum, and the waste liquid is used, and the lower layer is the water-based cleaning agent according to embodiment 1.

[0057] The glass sheet was cleaned with the water-based cleaning agent according to Example...

Embodiment 2

[0060] This example relates to the preparation of a water-based cleaning agent comprising polyhedral oligomeric silsesquioxanes.

[0061] The specific experimental steps of this embodiment are as follows. First, add 740kg of pure water to the 1500L enamel kettle. Then, start stirring, weigh 30kg of APG and add it to the kettle, add 30kg of sodium ethylenediamine tetramethylene phosphonate (EDTMPS), add 100kg of sodium hydroxide, then add 50kg of sodium silicate, 20kg of ethylene glycol butyl ether, defoaming Agent 12kg, peroxybenzoic acid 1kg and octaamino polyhedral oligomeric silsesquioxane 0.5kg. Continue to stir and cool down to 20-25°C, and let stand for 4 hours. Filtration and blowing, the feed liquid has two layers, and the upper layer is filled with an iron bucket, which is used as waste liquid, and the lower floor is the water-based cleaning agent according to embodiment 2.

[0062] The glass sheet was cleaned with the water-based cleaning agent according to Exampl...

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Abstract

The invention relates to a water-based cleaning agent containing polyhedral oligomeric silsesquioxane, which is prepared from the following raw material ingredients: a first solubilizer, a second solubilizer, a chelating agent, alkali metal hydroxide, a builder, a defoaming agent, a bactericide, hydrophilic polyhedral oligomeric silsesquioxane and water. The invention further relates to a method of preparing the water-based cleaning agent containing polyhedral oligomeric silsesquioxane. The cleaning agent comprises a specific surfactant and hydrophilic polyhedral oligomeric silsesquioxane; dueto a synergistic effect of the raw material ingredients, organic pollutants and metal ions on the surfaces of different materials can be effectively removed; and the cleaning agent is high in decontamination efficiency and particularly applicable to cleaning of glassware and silicon wafer substrates in the semiconductor industry.

Description

technical field [0001] The present application relates to the technical field of surface cleaning. Specifically, the present application relates to a water-based cleaning agent comprising polyhedral oligomeric silsesquioxane and a preparation method thereof. Background technique [0002] At present, when cleaning precision glass instruments or equipment in the industry, Freon, trichloroethane, carbon tetrachloride and chlorofluorocarbon solvent cleaning agents (referred to as ODS substances), alkaline water-based cleaning agents, water-based medium-temperature cleaning agents, and ultrasonic cleaning agents are generally used. Cleaning agents and methods such as cleaning, spray cleaning agent and ultrasonic combination cleaning. However, these knowledge and methods are not particularly effective in cleaning oily organic pollutants, with more residues and greater corrosion to the cleaned objects. Some cleaning agents may even pollute the environment and destroy the ecologica...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C11D1/66C11D3/04C11D3/08C11D3/16C11D3/20C11D3/34C11D3/36C11D3/37C11D3/39C11D3/60
CPCC11D1/662C11D3/044C11D3/08C11D3/162C11D3/2068C11D3/349C11D3/364C11D3/373C11D3/3945
Inventor 冉晓玲
Owner SHANGHAI YINUO BIOTECH CO LTD